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Ion source, operating method of ion source, and ion source system

An ion source, plasma technology, applied in the direction of plasma, ion beam tube, radiation/particle processing, etc., can solve problems such as impossibility

Inactive Publication Date: 2003-12-10
NISSIN ION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the related art ion source 2, it is almost impossible to obtain such a low temperature of the plasma generation chamber 6

Method used

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  • Ion source, operating method of ion source, and ion source system
  • Ion source, operating method of ion source, and ion source system
  • Ion source, operating method of ion source, and ion source system

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Embodiment Construction

[0030] figure 1 is a sectional view of the ion source according to the first embodiment of the present invention. For simplicity, similar or identical parts are used as Figure 4 The same reference numerals are used in the examples of the related art shown. The description will mainly focus on differences from the ion sources of related art examples.

[0031] The ion source 2a is equipped with a gas introduction pipe 18, but is not equipped with a steam generator. Support body 34a corresponds to Figure 4The support member 34 in. The support body 34 a supports the plasma generation chamber 6 of one plasma generation section 4 on the basis of the ion source flange 36 . Inside the support body 34 a , a cavity 40 is provided in a range from a position near the plasma generation chamber 6 to a position near the ion source flange 36 . More particularly, the support body 34a is a tubular body having a bottom surface 41, and the cavity 40 is provided inside the support body 34a....

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PUM

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Abstract

In an ion source, within a support body which supports a plasma production chamber for producing a plasma on the basis of an ion source flange, a cavity is provided ranging from a position near the plasma production chamber to a position near the ion source flange. The cavity serves as a cooling medium passage which introduces a cooling medium to a position near the plasma production chamber to cool the plasma production chamber. The plasma production chamber is cooled at a position very near it by the cooling medium. Therefore, temperature of the plasma production chamber at the time of plasma production is kept at low temperatures.

Description

technical field [0001] The present invention relates to an ion source, a method of operating such an ion source and an ion source system having such an ion source, which generates a plasma and separates an ion beam from the generated plasma, in particular, The present invention relates to a method of maintaining the temperature of a plasma generation chamber for generating plasma at a low temperature during plasma generation, and to selectively operating an ion source in a low temperature mode of operation and a high temperature mode of operation of the plasma generation chamber Methods. Background technique [0002] Figure 4 An example of a related art ion source is shown. The ion source 2 includes a plasma generating section 4 that ionizes ion species such as gas or vapor input into the plasma generating section 4 to generate a plasma 14 . The plasma generating section 4 is supported by a plurality (usually 4) of strip-like supports (support rods in this example) based ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G21K1/00G21K5/04H01J27/04H01J27/08H01J27/20H01J37/08H05H1/24
CPCH01J27/20H01J27/04H01J37/08
Inventor 木山俊昭
Owner NISSIN ION EQUIP CO LTD