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Method and apparatus for measuring wavefront aberrations

A technology of wave aberration and wave measurement, applied in the field of wave front aberration measurement, can solve the problems of hindering the measurement optical system, obstruction, etc.

Inactive Publication Date: 2004-02-25
JOHNSON & JOHNSON VISION CARE INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0010] The limitations imposed by the aberroscope and the Hartmann-Shack method limit the effectiveness of these systems for measuring large aberrations with high spatial resolution
These limitations prevent the measurement of optical systems with large aberrations, thereby preventing them from realizing their full potential

Method used

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  • Method and apparatus for measuring wavefront aberrations
  • Method and apparatus for measuring wavefront aberrations

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Embodiment Construction

[0024] Figure 5 Shown is a preferred embodiment of a wavefront measuring device 100 according to the invention. exist Figure 5 In a general overview of the device 100 shown, a radiation source 110 generates a light beam 112 . The light beam 112 passes through an optical beam splitter 114 unchanged. Another beam splitter 116 then redirects the light beam 112 to an optical system 115 , such as an eye 118 . The light beam 112 enters the eye 118 through the cornea 120 where it is reflected by the retina 124 to produce a point source imaging wavefront 126 that travels back out of the eye 118 . The wavefront 126 is affected by imperfections in the eye 118, producing aberrations. The affected wavefront 126 passes through the beam splitter 116 to a reflecting device 128 . Each mirror region 130 within the reflecting device 128 selectively reflects portions of the wavefront 126 via redirecting mirrors 134 to an imaging device 132 that captures information related to the wavefron...

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Abstract

An apparatus and method for measuring wavefront aberrations. The apparatus comprises a reflecting device (128) for reflecting selected portions of the wavefront (126), an imaging device (132) for capturing information related to the selected portions, and a processor (136) for calculating aberrations of the wavefront from the captured information. The method comprises reflecting selected portions of a wavefront (126) onto the imaging device (132), capturing information related to the selected portions, and processing the captured information to derive the aberrations.

Description

technical field [0001] The present invention relates generally to optical instruments, and more particularly to a method and apparatus for measuring wavefront aberrations. The invention is particularly (but not exclusively) useful in the measurement of optical wavefronts in ophthalmic applications, such as the measurement of ocular aberrations in corrective devices such as lenses (e.g., contact lenses, spectacles, intraocular), and in Evaluate eye aberrations before, during, and after refractive surgery to improve vision. Background technique [0002] The human eye is an optical system that uses lenses to focus light rays representing an image onto the retina within the eye. One factor that determines the visual acuity of the eye is the sharpness of the image produced on the retina. However, imperfections in the lens and other components and matter in the eye can divert the light rays from the desired path. These deviations, which can lead to blurred images and reduced vi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M11/02A61B3/10A61B3/103G01J9/00
CPCA61B3/1015G01J9/00G01J1/0414A61B3/103
Inventor B·A·达维斯M·J·科林斯D·R·伊斯坎德J·H·罗夫曼D·F·罗斯三世
Owner JOHNSON & JOHNSON VISION CARE INC
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