Duty-cycle-efficent SRAM cell test
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INT BUSINESS MASCH CORP
- Publication Date
- 2004-08-04
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The present invention relates generally to the testing of semiconductor memory cells, and in particular to improved methods and structures for stressing and testing contacts within semiconductor structures. Background technique
[0002] A typical semiconductor static random access memory (SRAM) device includes a plurality of word lines, a pair of bit lines and memory cells, wherein cell latches and pass devices are connected between the word lines and the pair of bit lines the intersection between. The pass devices of the memory cells are connected to the pair of bit lines through bit line contacts. These bit line contacts allow the contents of the memory cell to be successfully read from and written to the cell latch during a read or write operation. A bitline contact with too much resistance (resistive bitline contact) will not properly allow reading or writing of the memory cell. Resistive bitline contacts can occur as a result of mechanical fail...