Method for manufacturing image sensor
A technology for image sensors and packaging substrates, which is applied in semiconductor/solid-state device manufacturing, electric solid-state devices, semiconductor devices, etc., can solve the problems of not being able to provide image sensor grain grounding, restricting the grounding position, and affecting the image sensor grain circuit layout, etc. , to achieve the effect of reducing the gold-plated area, improving reliability, and reducing manufacturing costs
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[0039] see Figure 1 to Figure 5 , shown in the figure is the selected embodiment structure of the present invention.
[0040] see figure 1 , the method for manufacturing an image sensor of this embodiment, which includes the following steps:
[0041] 1. Substrate production:
[0042] A substrate 10 with a metal layer is planned into a plurality of packaging substrate 11 regions arranged in a matrix. The two sides of the substrate 10 are respectively defined as a top surface 101 and a bottom surface 102. The metal layers of the bottom surfaces 101 and 102 respectively form a plurality of internal wiring 15, external wiring 12 and a crystal base 16 located in the central part of the top surface 101, and each package substrate is respectively drilled with a blind hole (or bowl hole) 13 corresponding to the external wiring. And with the side border of each package substrate as the center of the blind hole, the internal wires and external wires of each package substrate are co...
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