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Substrate processing apparatus and substrate processing method

A technology of substrate processing device and substrate processing method, which is applied in the directions of transportation and packaging, program control, comprehensive factory control, etc., and can solve problems such as deviation and different consumption levels of parts

Inactive Publication Date: 2005-08-10
TOKYO ELECTRON LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, for example, under the situation of carrying out the processing of 25 semiconductor wafers in the box, the processing of 13 semiconductor wafers is carried out in the first processing part, the processing of 12 semiconductor wafers is carried out in the second processing part, and the processing of 12 semiconductor wafers is carried out in the first processing part and The frequency of use in the second processing part produces deviations, which may produce differences in the maintenance cycle and the degree of part consumption within the processing part

Method used

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  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method

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Embodiment Construction

[0046] Hereinafter, embodiments of the substrate processing apparatus of the present invention will be described in detail with reference to the drawings.

[0047] FIG. 1 is a diagram schematically showing a schematic configuration of a substrate processing apparatus according to an embodiment of the present invention.

[0048] As shown in FIG. 1 , the substrate processing apparatus includes a plurality of (two in the apparatus of FIG. 1 ) processing ships PS1 and PS2 constituting a processing unit for performing predetermined processing on a semiconductor wafer W, and a structure for transporting the semiconductor wafer W to Among them, the load assembly LM of the conveying mechanism is combined.

[0049] Load module LM is composed of a plurality of load ports LP1 to LP3 for storing semiconductor wafer W (three in the apparatus of FIG. 1 ), transfer chamber TR for transferring semiconductor wafer W, and orienter OR for positioning semiconductor wafer W.

[0050] The orienter...

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Abstract

In a controller MC, information on a process room (PM) (last process PM) which conducted a process last for the previous lot is stored. When starting processing for the current lot, the semiconductor wafers W are loaded in process rooms, beginning with the process room next to the last process PM (for example, a process room (PM2) when the last process PM is a process room (PM1)). This allows the processors to be used evenly and minimizes variations in maintenance cycles and in the wearing of parts in the processors.

Description

technical field [0001] The present invention relates to a substrate processing apparatus and a substrate processing method for performing processing such as film formation or etching on a substrate to be processed such as a semiconductor wafer or a glass substrate for a liquid crystal display device. Background technique [0002] A conventionally known substrate processing apparatus is a substrate processing apparatus that performs film formation, etching, etc. on a substrate to be processed such as a semiconductor wafer or a glass substrate for liquid crystal display, and has a plurality of processing sections and a transport mechanism connected to these processing sections. , the substrate to be processed is sequentially transported to a plurality of processing sections by a transport mechanism, and the same processing or different processing is performed in each processing section, so as to effectively use resources and space, etc., and to process the substrate to be proce...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677G05B19/418H01L21/00H01L21/02
CPCG05B19/41865H01L21/67276G05B2219/45031G05B2219/32315Y02P90/02H01L21/02H01L21/68
Inventor 沼仓雅博
Owner TOKYO ELECTRON LTD