Method for making metal picture
A photo and metal technology, applied in the field of making metal photos by MEMS LIGA technology, can solve the problems of poor resolution, not suitable for making a small amount of metal photos, and unable to express high resolution, etc., and achieve the effect of reducing costs
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[0019] see Figure 4 to Figure 7 , Figure 4 to Figure 7 It is a schematic diagram of a method for making a metal photo according to a preferred embodiment of the present invention. Such as Figure 4 As shown, firstly, a substrate 10 is provided, and a photoresist layer 12 is coated on one surface of the substrate 10 . Wherein, the substrate 10 can be a glass substrate or other insulating substrates, and the material of the photoresist layer 12 can be selected from wet photoresist or dry film photoresist depending on the actual situation. In addition, the photoresist layer 12 may also use a positive or negative photoresist as required, depending on the pattern on the photomask or negative used subsequently, or according to the pattern transfer times of the finished product. Form the correct pattern on the finished product.
[0020] Such as Figure 5 As shown, a patterned negative 14 is then used as a photomask to perform an exposure and development process to form a photo...
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