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Chemical vapor deposition high temperature furnace used water cooling furnace wall

A technology of chemical vapor deposition and high-temperature furnace, which is applied in the direction of furnace cooling device, gaseous chemical plating, metal material coating process, etc., can solve the problems of poor cooling effect, uneven temperature, local overheating, etc., and achieve high cooling efficiency, The effect of uniform temperature and prevention of cooling water backflow

Inactive Publication Date: 2007-03-14
赵建国
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to solve the technical difficulties of poor cooling effect, easy local overheating and uneven temperature existing in the existing furnace wall, and to provide a chemical vapor deposition high temperature furnace with good cooling effect, uniform temperature of the furnace wall and the ability to prevent backflow of cooling water. Furnace water cooling furnace walls

Method used

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  • Chemical vapor deposition high temperature furnace used water cooling furnace wall
  • Chemical vapor deposition high temperature furnace used water cooling furnace wall
  • Chemical vapor deposition high temperature furnace used water cooling furnace wall

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] As shown in Figures 2 and 3, the water-cooled furnace wall used in the chemical vapor deposition high-temperature furnace in this embodiment includes a jacketed furnace wall made of an outer casing 2 and an inner casing 5, wherein: in the jacketed furnace There are 16 partitions 4 in the vertical direction in the interlayer of the wall, and the spacing of the partitions 4 is 50mm; the gap between the two partitions 4 is 50mm up and down, so that the cooling water flows in the jacketed furnace wall along the path planned by the partitions. Orderly flow to reduce furnace wall temperature. Among the figure, 1 is the water inlet, and 3 is the water outlet.

[0015] As shown in Figure 4, a one-way door 6 can be set at the water inlet position of the jacketed furnace wall, so as to prevent the cooling water in the furnace wall interlayer from flowing backwards in the case of a sudden water stop; A temperature sensor 7 is set at the water outlet of the water outlet, so that t...

Embodiment 2

[0017] As shown in Figures 2 and 3, the water-cooled furnace wall used in the chemical vapor deposition high-temperature furnace in this embodiment includes a jacketed furnace wall made of an outer casing 2 and an inner casing 5, wherein: in the jacketed furnace There are 24 partitions 4 in the vertical direction in the interlayer of the wall, and the distance between the partitions 4 is 70mm; the gap between the two partitions 4 is 70mm up and down, so that the cooling water flows in the jacketed furnace wall along the path planned by the partitions. Orderly flow to reduce furnace wall temperature. Among the figure, 1 is the water inlet, and 3 is the water outlet.

[0018] All the other structures are the same as in Example 1.

Embodiment 3

[0020] As shown in Figures 2 and 3, the water-cooled furnace wall used in the chemical vapor deposition high-temperature furnace in this embodiment includes a jacketed furnace wall made of an outer casing 2 and an inner casing 5, wherein: in the jacketed furnace There are 30 partitions 4 in the vertical direction in the interlayer of the wall, and the spacing of the partitions 4 is 100mm; the gap between the two partitions 4 is 100mm up and down, so that the cooling water flows in the jacketed furnace wall along the path planned by the partitions. Orderly flow to reduce furnace wall temperature. Among the figure, 1 is the water inlet, and 3 is the water outlet.

[0021] All the other structures are the same as in Example 1.

[0022] The number of partitions in the above embodiments can be determined according to the size of the chemical vapor deposition high temperature furnace.

[0023] For a large-scale chemical vapor deposition furnace, the interlayer of the jacketed furn...

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Abstract

The present invention is one sandwiched water cooled high temperature furnace wall formed through chemical vapor deposition. The sandwiched water cooled high temperature furnace wall includes one outer casing and one inside casing to constitute the sandwiched furnace wall, and between the outer casing and the inside casing, there are vertically set partition boards in the interval of 50-100 mm and staggered vertically by 50-100 mm, so that the cooling water can flow along the planed path to lower the furnace wall temperature effectively. The present invention has the advantages of good cooling effect, homogeneous furnace wall temperature, capacity of preventing back flow of cooling water, etc.

Description

technical field [0001] The invention relates to a water-cooled furnace wall for a chemical vapor deposition high-temperature furnace, which belongs to a jacketed water-cooled furnace wall for a wall-cooled chemical vapor deposition high-temperature furnace. Background technique [0002] The chemical vapor deposition process and the high-temperature heat treatment process under vacuum or inert gas protection all use high-temperature furnaces, and the wall-cooled high-temperature furnace is the most commonly used high-temperature furnace. Especially in recent years, the wide application of thermal gradient chemical vapor deposition process and chemical liquid vapor deposition process in the field of preparation of ceramic matrix composites has put forward higher requirements for the furnace wall cooling of high temperature furnaces, not only requiring high cooling efficiency, but also The temperature of the furnace wall is required to be uniform. The cooling of the furnace wa...

Claims

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Application Information

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IPC IPC(8): C23C16/00F27D1/12
Inventor 赵建国杨国臣王海青崔爱军冯锋
Owner 赵建国