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Photoresist composition for forming light-proof pattern of plasma display device

A plasma display and photosensitive resin technology, applied in the field of photosensitive resin compositions, can solve the problems of difficulty in obtaining good patterns, residues on patterned substrates, increase in light-shielding substances, etc., and achieve excellent light-shielding properties, excellent display contrast, and development. Tolerant effect

Inactive Publication Date: 2010-05-26
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the case of the techniques shown in Patent Documents 1 and 2, if the content of the light-shielding substance is increased, the optical density becomes high, and light does not reach the depth of the film during photocuring, resulting in insufficient photocuring.
As a result, the linearity of the pattern is lowered due to the decrease in the development tolerance, and the pattern is peeled off from the substrate and residues are generated on the substrate, so there is a problem that it is difficult to obtain a good pattern of black electrodes or black stripes.

Method used

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  • Photoresist composition for forming light-proof pattern of plasma display device
  • Photoresist composition for forming light-proof pattern of plasma display device
  • Photoresist composition for forming light-proof pattern of plasma display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0108] Using three rollers, 100 parts by mass of n-lauryl methacrylate / n-butyl methacrylate / methacrylic acid=20 / 60 / 20 (mass%) copolymer (Mw =150,000); and 10 parts by mass of ethanone as (C) photopolymerization initiator, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazole-3-substituted base]-, 1-(o-acetyl oxime) (CGI242, manufactured by Ciba Chemicals); and 20 parts by mass of pentaerythritol tetraacrylate as (D) photopolymerizable compound and 20 parts by mass of EO-modified trimethylol propane triacrylate (M-350 manufactured by Toagosei Co., Ltd.); and 150 parts by mass of Ni powder (average particle diameter 0.02 μm) as a conductive (A) light-shielding material; 50 parts by mass of Ni powder as a conductive material Ag powder (average particle diameter: 0.05 μm) was kneaded on a three-roll mill to prepare a photosensitive resin composition. The photosensitive resin composition was uniformly coated on a PET film (thickness of 38 μm) and dried in a hot air convection dryer at 70° C...

Embodiment 2

[0111] First, in addition to using 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(o-benzoyl oxime) (CGI124, manufactured by Ciba Chemicals) 10 parts by mass as ( C) Except for the photopolymerization initiator, the photosensitive resin composition was prepared in the same manner as in Example 1 to obtain a photosensitive dry film.

[0112] Next, on the substrate obtained by washing and drying the glass plate (PD200) manufactured by Asahi Glass Co., Ltd., while removing the protective film, the temperature of the drum was 105° C., and the pressure of the drum was 2.9×10 -3 The photosensitive dry film was laminated under conditions of Pa and a drum speed of 1 m / min. Then, using a 3.5kw ultra-high pressure mercury lamp (manufactured by Hakuto Corporation) at 300mJ / cm 2 After exposing under conditions, spray development was performed for 45 seconds in a 0.3% by mass aqueous sodium bicarbonate solution to form a pattern. After the pattern is formed, the resin is burned to ashes b...

Embodiment 3

[0114] First, in addition to the photopolymerization initiator of Example 1, 5 parts by mass of imidazole group, namely 2-(o-chlorobenzene)-4,5-bisbenzimidazole dimer (B- CIM) Except for the (C) photopolymerization initiator, the photosensitive resin composition was prepared in the same manner as in Example 1, and a photosensitive dry film was obtained.

[0115] Next, on the substrate obtained by washing and drying the glass plate (PD200) manufactured by Asahi Glass Co., Ltd., while removing the protective film, the temperature of the drum was 105° C., and the pressure of the drum was 2.9×10 -3 The photosensitive dry film was laminated under conditions of Pa and a drum speed of 1 m / min. Then, using a 3.5kw ultra-high pressure mercury lamp (manufactured by Hakuto Corporation) at 150mJ / cm 2 After exposing under conditions, spray development was performed for 45 seconds in a 0.3% by mass aqueous sodium bicarbonate solution to form a pattern. After the pattern is formed, the res...

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Abstract

The provide a photosensitive resin composition for light-blocking pattern formation of a plasma display in which an excellent black electrode that has a high linearity but has no pealing-off or residues, and the light-blocking pattern represented by black stripes can be formed easily. This photosensitive resin composition contains a photo-polymerization initiator, a light shielding material, a binder resin and a photo-polymerizing compound shown in a formula (I). By containing these compounds, the light-sensitivity of the photosensitive resin composition becomes higher, and a development margin of the pattern becomes larger. Consequently, even when the photosensitive resin composition contains larger amount of light-blocking materials, patterns that have excellent linearity but have no pealing-off or residues can be formed easily, and a PDP having a high contrast and beautiful color development can be provided easily.

Description

technical field [0001] The present invention relates to a photosensitive resin composition for forming a light-shielding pattern on a plasma display panel (hereinafter referred to as PDP) in a self-luminous plasma display using gas discharge. Background technique [0002] Plasma displays that form images by making multiple microcells emit light spontaneously by utilizing the discharge phenomenon have excellent features that cannot be realized with conventional displays such as large screen size, thinner thickness, lighter weight, and planarization, and their popularization is expected. [0003] Generally, a PDP is configured to have a pair of electrodes regularly arranged on two glass substrates facing each other, and a rare gas such as neon gas, xenon gas, or helium gas is sealed between the electrodes. If a voltage is applied between the electrodes, it will cause discharge in the micro cells around the electrodes, and each cell will emit light accordingly for display. The...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027G03F7/031H01J11/22H01J11/24H01J11/34H01J11/44
CPCG03F7/0007G03F7/027G03F7/028G03F7/032
Inventor 田中幸彦节田齐城山泰佑带谷洋之
Owner TOKYO OHKA KOGYO CO LTD
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