Process for manufacturing glass substrate for magnetic recording medium and glass substrate for magnetic recording medium obtained by the process

Abstract

A process for manufacturing a glass substrate for a magnetic recording medium, comprising polishing a glass substrate is polished using abrasive grains and then washing the substrate using a 0.02-0.3% aqueous hydrofluoric acid solution, and a glass substrate for a magnetic recording medium which is manufactured by the process. A polished glass substrate for a magnetic recording medium is manufactured, whereby during washing after polishing of the glass substrate, manifestation of substrate surface defects and overall waviness of the substrate can be minimized, and whereby texture formation in the subsequent texturing step can be accomplished in uniform manner without creating variation between substrates.

Description

[0001] Cross References to Related Applications [0002] This application is an application filed under 35 U.S.C. §111(a), claiming the benefit of priority under 35 U.S.C. §119(e)(1) to provisional application 60 / 606,438, filed September 2, 2004, which is Filed under 35 U.S.C. §111(b). technical field [0003] The present invention relates to a method of manufacturing a glass substrate for magnetic recording media, and a glass substrate for magnetic recording media manufactured by the method. More specifically, the present invention relates to a method of manufacturing a glass substrate for magnetic recording media in which the glass substrate is polished and then washed before texturing, and to a method for magnetic recording Medium glass substrate. Background technique [0004] Glass substrates used for magnetic recording media such as hard disks must have a high degree of flatness and smoothness. The glass substrate is therefore subjected to a surface polishing step an...

AI Technical Summary

Problems solved by technology

[0006] For amorphous glass substrates, washing with inorganic or organic acids is common after polishing (see, for example, Japanese Unexamined Patent Publication No. 2003-212603), but conventional washing methods lead to uneven formation in the subsequent texturing step texture, thereby creating differences between substrates, creating distinct defects on the surface of the substrate, or generating overall waviness within the substrate, therefore, washing methods that avoid these problems are desirable