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Substrate processing apparatus and substrate processing method

a substrate processing and substrate technology, applied in the direction of photomechanical treatment, instruments, photosensitive materials, etc., can solve the problems of defective dimension, defective shape of exposure pattern, and inability to make resist pattern finer than

Inactive Publication Date: 2006-07-06
SOKUDO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0011] It is an object of the invention to provide a substrate processing apparatus and a substrate processing method capable of preventing a component of a photosensitive material on a substrate from being eluted in a liquid in an exposure device.

Problems solved by technology

With such conventional exposure devices, however, the line width of an exposure pattern is determined by the wavelength of the light source of an exposure device, thus making it impossible to make a resist pattern finer than that.
The resist component eluted in the liquid remains on a surface of the substrate, which may become the cause of a defect.
This may cause a defective dimension and a defective shape of the exposure pattern.

Method used

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  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method
  • Substrate processing apparatus and substrate processing method

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Embodiment Construction

[0114] A substrate processing apparatus according to embodiments of the invention will be described below with reference to the drawings. A substrate as used in the specification includes a semiconductor substrate, a substrate for a liquid crystal display, a substrate for a plasma display, a glass substrate for a photomask, a substrate for an optical disk, a substrate for a magnetic disk, a substrate for a magneto-optical disk, and a substrate for a photomask.

[0115]FIG. 1 is a plan view of a substrate processing apparatus according to an embodiment of the invention.

[0116]FIG. 1 and each of the subsequent drawings is accompanied by the arrows that indicate X, Y, and Z directions perpendicular to one another, for clarification of positions. The X and Y directions are perpendicular to each other in a horizontal plane, and the Z direction corresponds to the vertical direction. In each of the directions, the direction toward an arrow is defined as + direction, and the opposite directio...

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Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing / development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing / development processing block before the substrate is subjected to the exposure processing by the exposure device.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to substrate processing apparatuses and substrate processing methods for applying processing to substrates. [0003] 2. Description of the Background Art [0004] A substrate processing apparatus is used to apply a variety of processing to substrates such as semiconductor substrates, substrates for use in liquid crystal displays, plasma displays, optical disks, magnetic disks, magneto-optical disks, photomasks, and other substrates. [0005] Such a substrate processing apparatus typically applies a plurality of successive processing to a single substrate. The substrate processing apparatus as described in JP 2003-324139 A comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block as an external device separate from the substrate proc...

Claims

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Application Information

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IPC IPC(8): G03D5/00
CPCG03F7/70341G03F7/70991
Inventor YASUDA, SHUICHIKANAOKA, MASASHIKANEYAMA, KOJIMIYAGI, TADASHISHIGEMORI, KAZUHITOASANO, TORUTORIYAMA, YUKIOTAGUCHI, TAKASHIMITSUHASHI, TSUYOSHIOKUMURA, TSUYOSHI
Owner SOKUDO CO LTD
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