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Vapor chamber and supporting structure of the same

a technology of a supporting structure and a vapor chamber, which is applied in the direction of basic electric elements, semiconductor devices, lighting and heating apparatus, etc., can solve the problems of poor heat-conducting efficiency of the vapor chamber, affecting the heat-conducting performance of the heat-generating element, and unable to meet the requirements of the operation of the central processing unit by the heat-dissipating device constituted of an aluminum-extruded heat sink and a fan

Inactive Publication Date: 2010-01-14
CELSIA TECH TAIWAN INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

"The present invention provides a vapor chamber with a supporting structure that enhances heat conduction efficiency. The supporting structure can be designed into various modular sub-structures to reduce production costs. The alternating arrangement of crests on neighboring wavelike pieces ensures uniform force exerted on the vapor chamber and prevents collapsing and deformation. The vapor chamber includes a casing, a wick structure, and a supporting structure. The wick structure is distributed in the hollow room and the supporting structure abuts against an inside surface of the wick structure. The wavelike pieces are constituted of crests and troughs, and the crests of any two neighboring wavelike pieces are arranged in an alternating manner. A penetrating hole is provided at the crests and the troughs."

Problems solved by technology

Therefore, the traditional heat-dissipating device constituted of an aluminum-extruded heat sink and a fan cannot satisfy the requirement for the operation of the central processing unit.
Since the heat-conducting path is relatively long, the heat-conducting efficiency of the vapor chamber becomes poor, which also affects the heat-conducting performance of the heat-generating element.
Therefore, it is an important issue to overcome the drawbacks of prior art.

Method used

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  • Vapor chamber and supporting structure of the same
  • Vapor chamber and supporting structure of the same
  • Vapor chamber and supporting structure of the same

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Embodiment Construction

[0019]The detailed description and technical contents of the present invention will be explained with reference to the accompanying drawings. However, the drawings are illustrative only, but not used to limit the present invention.

[0020]Please refer to FIGS. 2 and 3. FIG. 2 is an exploded perspective view of the present invention, and FIG. 3 is a partially enlarged view showing the details of the portion A of the supporting structure in FIG. 2. The present invention is to provide a vapor chamber, which includes a casing 10, a wick structure 20, a supporting structure 30 and the working fluid 40.

[0021]The casing 10 comprises a lower shell 11 and an upper shell 12 for sealing the lower shell 11. A hollow room b is formed between the lower shell 11 and the upper shell 12. The lower shell 11 is constituted of a bottom plate 111 and a plurality of surrounding plates 112 for surrounding the circumference of the bottom plate 111. One of the surrounding plates112 is provided with a filling / ...

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PUM

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Abstract

A vapor chamber includes a casing, the working fluid, a wick structure and a supporting structure. The casing has a hollow room for allowing the working fluid to be filled therein. The wick structure is distributed in the hollow room. The supporting structure abuts against an inside surface of the wick structure. The supporting structure includes side plates and a plurality of wavelike pieces connected between the side plates. Each of the wavelike pieces is constituted of a plurality of crests and troughs. The crests of any two neighboring wavelike pieces are arranged in an alternating manner. A penetrating hole is provided at the crests and the troughs respectively. The working fluid flows through the separated passages and the penetrating holes. Via the above arrangement, the heat-conducting efficiency of the vapor chamber can be enhanced.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a supporting structure, and in particular to a vapor chamber and a supporting structure of the same.[0003]2. Description of Prior Art[0004]With the increase in the operation speed of a central processing unit of a computer, it generates more and more heat. Therefore, the traditional heat-dissipating device constituted of an aluminum-extruded heat sink and a fan cannot satisfy the requirement for the operation of the central processing unit. Thus, many manufacturers develop heat pipes and vapor chambers that have larger heat-conducting performance, and combine the heat pipes and vapor chamber with the heat sink, thereby solving the current problems relating to heat dissipation. Among these heat-dissipating means, more and more manufactures pay attention to and devote themselves to the development of vapor chambers because the vapor chamber has a large area that is brought into direct cont...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): F28D15/04F28D15/00
CPCF28D15/0233F28D15/046H01L23/427H01L2924/0002H01L2924/00
Inventor MEYER, IV, GEORGE ANTHONYLU, YUNG-TAISUN, CHIEN-HUNGHSIEH, MING-KUEILEE, I-YING
Owner CELSIA TECH TAIWAN INC