Gas diverter for well and reservoir stimulation

Abstract

The fracturing methods described in the present disclosure provide advantage over the current fracturing methods. The disclosed fracturing methods can change the fracture gradient of the downhole subterranean formation. For example, one or more of the fracture gradients of the low and high stress zones of the downhole subterranean formation can be changed. Furthermore, the methods of present disclosure, in relation to current practices, can decrease the extent and/or degree of fracturing within low stress downhole formations and increase the degree of fracturing within high stress formations.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application claims priority under 35 U.S.C. § 119 to U.S. Provisional Patent Application No. 62 / 627,138, which was filed Feb. 6, 2018.[0002]The present application is also a continuation-in-part application of and claims priority to U.S. patent application Ser. No. 15 / 870,713, which was filed Jan. 12, 2018.[0003]The present application is also a continuation-in-part application of and claims priority to U.S. patent application Ser. No. 15 / 870,677, which was filed Jan. 12, 2018.[0004]The present application also claims priority under 35 U.S.C. § 119 to U.S. Provisional Patent Application No. 62 / 594,539, which was filed Dec. 4, 2017.[0005]U.S. patent application Ser. Nos. 15 / 870,713 and 15 / 870,677 are continuation applications of and claim priority to U.S. patent application Ser. No. 14 / 957,182, which was filed Dec. 2, 2015.[0006]U.S. patent application Ser. No. 14 / 957,182 claims priority under 35 U.S.C. § 119 to U.S. Provisiona...

AI Technical Summary

Benefits of technology

[0127]In accordance with some embodiments of the present disclosure is a method for protecting a target well from being fractured that includes injecting a gas into a target wellbore, where the injected gas occupies a target subterranean formation comprising at least about 1 scf / lfCA over a lfCA from about 1 foot to about 15 miles of the target wellbore, and where adjacent to the target wellbore is an interferer wellbore. The interferer wellbore can be one or more of wells scheduled for fracturing, undergoing a fracturing process, or both. Generally, the injected gas occupying the target subterranean formation substantially prevents the fractures generated during the fracturing process of the interferer well from propagating into the target subterranean formation or multiple formations. It can be appreciated that the injected gas occupying the target subterranean formation substantially prevents well bashing and / or well interference. Moreover, the injected gas occupying the target subterranean formation substantially shields and / or protects the target subterranean formation or multiple formations from being fractured by the fracturing system of adjacent interfering wellbores.

Problems solved by technology

More particularly, the process of the present disclosure in relation to current practices can decrease the extent and / or degree of fracturing within the low stress downhole formations and increase the degree of fracturing within the high stress formations.

It can be appreciated that solid particles can be detrimental to well health and productivity.

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