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Polishing compound

a technology of polishing compound and polishing composition, which is applied in the direction of polishing composition, aqueous dispersions, other chemical processes, etc., to achieve the effect of increasing the abrasiveness and the resulting buffing effect, avoiding potential scratching of larger particles, and increasing buffing capacity

Inactive Publication Date: 2007-07-10
R T VANDERBILT CO INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009]The present invention provides a buffing composition which has good or better workability and provides excellent sheen, and which minimizes swirl marks and hazing of the coating. The inventive composition is advantageously prepared from a fraction produced during the processing of smectite clay. Nevertheless, the composition may of course be prepared per se from the basic components. Depending on the origin of the source, the processing yields contain varying amounts of smectite clay, calcium carbonate and feldspar, as well as quartz. The smectite clay may be comprised of montmorillonite, hectorite, saponite or mixtures thereof; while feldspar may include potassium and / or sodium-potassium aluminum silicates [(Na,K) AlSi3O8, KAlSi3O8], as well as calcium and barium aluminum silicates; the calcium carbonate may include CaCO3 and / or CaMg(CO3)2. The solid ingredients are provided in a water base to form an aqueous fraction, with an amount of a workability enhancing additive, such as a heavy hydrocarbon, e.g. kerosene. Other workabilty enhancers may be used, including such organic solvents such as glycol ethers or glycerine. A relatively small amount of surfactant is also preferably added to encourage the homogenization of the hydrocarbon and aqueous fractions. This may be a nonionic, cationic or anionic surfactant.
[0011]Prior art compositions have a relatively small particle size (average about 2-17 μm, maximum about 35 μm). The present invention has an average particle size of about 30-45 μm, and contains particles up to about 100 μm. While the larger particles may have the effect of increasing the abrasiveness and the resulting buffing effect, they can also lead to scratching. Applicants have found that with the inventive composition, the potential scratching of the larger particles is avoided, while allowing the increased buffing capacity to take effect. It is theorized that this may have to do with the presence of one or both of the clay or the carbonate.

Problems solved by technology

While the larger particles may have the effect of increasing the abrasiveness and the resulting buffing effect, they can also lead to scratching.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012]Accordingly, a buffing composition is provided which comprises (all amounts in mass percent):

[0013]

(1) calcium carbonate  20-30%(2) feldspar  7-59%(3) smectite clay  3-7%(4) water  37-64%(5) quartz0.01-1%(6) opal CT  1-2%(7) kerosene  3-20%(8) surfactant0.01-1%(9) preservative

[0014]It is noted that opal CT may be present as naturally occurring components in a smectite process stream. It is not believed that this component affects the buffing characteristics and therefore it is not considered as part of the invention. The average particle size of the composition should be between about 30 and 45 μm, while the particle size may be up to about 100 μm. While the minimal size is preferably at least 1 μm, it should be recognized that smaller particles may be present so long as the preferred average size is achieved. A preservative, such as KATHON® CG / ICP (or CG / ICP II) from Rohm & Haas or 4,4-dimethyloxazolidine BIOBAN® CS-1135 biocide from Dow Chemicals may also optionally be prese...

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Abstract

An abrasive composition is provided based on the following:an abrasive, preferably feldspar  7-59%a clay, preferably smectite clay  3-7%water  37-64%an organic solvent, such as kerosene  3-20%,and additionally, preferably containscalcium carbonate  20-30%, anda surfactant0.01-1%.The composition may have particles of up to 100 μm, and preferably average particle size diameter of 30-45 μm.

Description

[0001]This application claims priority under 35 USC 119(e) based on Ser. No. 60 / 543,464, filed Feb. 10, 2004.BACKGROUND OF THE INVENTION[0002]1. Field of the Invention[0003]The present invention relates to an abrasive polishing composition, such as a paste or liquid, particularly useful as a buffing composition for automotive coatings or the like, and more particularly for scratch removal and polishing. In addition, such a composition may be used in hard surface cleaners, cleaners for plastic and rubber surfaces, liquid cleansers and hand cleaners.[0004]The used automotive resale industry utilizes rubbing and polishing compounds during the cleanup and detailing process to achieve a high luster finish on auto bodies prior to the resale of a vehicle. The cleanup and detailing process typically involves washing the vehicle and then polishing the body finish with a rubbing compound to clear any noticeable scratches from the surface. This is followed by the application of a glazing compo...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): C09G1/02C09G1/04C09K3/14
CPCC09G1/02C09K3/1463
Inventor COLLINS, JR., GEORGE B.HENLEY, STANLEY BRENTANDERSON, JANIS WYLAM
Owner R T VANDERBILT CO INC