Semiconductor device with reduced electromigration
a technology of semiconductor elements and electromigration, applied in the direction of non-metallic protective coating applications, sustainable manufacturing/processing, final product manufacturing, etc., can solve the problems of failure of connection between semiconductor elements and other devices, operational failures, etc., and achieve high reliability semiconductors. the effect of preventing the deposition of wiring metal ions
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[0059]The present invention addresses electromigration problems in COF (chip on film) and other types of semiconductor devices. Electromigration occurs when the wiring material ionizes and deposits at high humidity. A metal ion binder forming a complex with metal ions is added into a basic component which comes in contact with the wiring. Alternatively, the binder is applied uniformly across the wire surface. The use of the binder restricts metal ion deposition in electromigration. The invention thus provides highly reliable COFs which allow for further reductions in wire pitches and increases in voltage.
[0060]The following will describe an embodiment of the present invention in reference to FIG. 1 through FIG. 8.
[0061]FIG. 1(a) is a plan view of a semiconductor device in accordance with the present invention. FIG. 2 is a cross-sectional view along line A-A′ in FIG. 1(a). FIG. 3 is a cross-sectional view along line B-B′ in FIG. 1(a).
[0062]A semiconductor device 11 in accordance with...
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