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Low cost photo etching technique

A low-level, integrated circuit technology, applied in the direction of optics, optomechanical equipment, and components for optomechanical processing

Inactive Publication Date: 2008-04-23
张国飙
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Low-cost photolithography can be used to make photolithographically programmed integrated circuits, etc.

Method used

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Experimental program
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Effect test

Embodiment Construction

[0076] 1. nF opening pattern and related technology

[0077] According to the present invention, a low-precision reticle (such as an nF open reticle) can be used to realize high-precision opening patterns (such as interlayer connections and segment lines).

[0078] A.nF opening graphics

[0079] During the process of opening pattern, an opening pattern is formed in the photoresist. Figure 2A depicts an opening 50o. It can interact with the metal lines 162 (and 174) adjacent to it. If the metal lines 162, 174 are located in two adjacent metal layers, the opening 50o can form an interlayer connection between them; on the other hand, the opening 50o can also divide the metal line 162 into two segments 162l, 162r. Correspondingly, interlayer connections and segment lines are called opening-like graphs (see also Figure 1). For interlayer connections, the dimensions Wo and Lo of the opening 50o can be larger than the line widths Dl and Dm (~1F) of the interconnection lines 162 a...

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PUM

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Abstract

A low-cost photoetching technology is based on two schemes: one using low-precision open mask to form high-precision open pattern, and another using arithmetic photoetching system and / or photoetch programming system to increase the reuse rate of photoetching mask. Its pattern distribution can also be used for high-precision mask.

Description

technical field [0001] The present invention relates to the field of integrated circuits, and more specifically to low-cost photolithography. Background technique [0002] Photolithography is a key process technology for forming thin film patterns in integrated circuits (ICs), which includes mask manufacturing, photolithography and other related process technologies. With the advancement of large-scale integrated circuit (VLSI) technology, masks are becoming more and more expensive. For example, the price of a 0.13μm technology mask is generally around 30,000 US dollars. Phase-shift mask (phase-shift mask, referred to as PSM) can cost more than $100,000; a set of reticles for 0.13μm technology is approaching $1 million. For ICs produced in small and medium batches, the reticle cost has become a large part of its cost. Aiming at the expensive lithography costs of opening patterns (such as interlayer connections and segment lines), high-precision reticles (such as OPC and PS...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00G03F1/16G03F7/00G03F1/38
Inventor 张国飙
Owner 张国飙