Picture element structure and liquid crystal display and manufacturing method thereof
A technology of liquid crystal display and pixel structure, which is applied in the direction of static indicators, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., and can solve the problems of decreased aperture ratio of pixel structure, affecting the utilization rate of backlight source, and low aperture ratio of pixel structure. Achieve stable display quality, high aperture ratio, and reduce stray capacitance
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no. 1 example
[0062] Please refer to Image 6 , Image 6 It is a schematic diagram of a pixel structure according to another embodiment of the present invention. The pixel structure 508 is located in a liquid crystal display, which includes a scan line 506 arranged along a first direction disposed on the substrate 600, a connecting electrode 504c arranged along a second direction, a data line segment 504a spanning the scan line 506, And it is electrically connected to another data line segment 504b through the connection electrode 504c to form a complete data line 504, and the scanning lines 506 and the data lines 504 intersect to define a matrix-shaped pixel structure 508.
[0063] The pixel structure 508 further includes a TFT 502 having a gate 502 b , a source 502 a and a drain 502 c , the source 502 a is electrically connected to the data line 504 , and the gate 502 b is electrically connected to the scan line 506 . Furthermore, the pixel structure 508 has a shielding electrode 512, w...
no. 2 example
[0069] The schematic diagram of the pixel structure of the second embodiment is similar to that of the first embodiment, so the advantage of the second embodiment can also be used Image 6 As a schematic illustration of the pixel structure. However, the processes of the first embodiment and the second embodiment are different. The first embodiment utilizes a back channel etching (BCE, back channel etching) process to manufacture thin film transistors; the second embodiment utilizes a back channel protection (Etch stop) The thin film transistor is manufactured by using a process to manufacture the thin film transistor, so the cross-sectional structure of the second embodiment is different from that of the first embodiment.
[0070] Please refer to Figures 10 to 13 , Figures 10 to 13 for Image 6 Schematic diagrams of the process along the tangent lines BB' and CC', respectively. Please refer to Figure 10 First, a patterned metal layer is formed on the substrate 900, whi...
no. 3 example
[0075] Please refer to Figure 14 , Figure 14 It is a schematic diagram of a pixel structure according to another embodiment of the present invention. The pixel structure 1308 is applied in a liquid crystal display, which includes a data line 1304 disposed on a substrate 1400 along a first direction, a scan line 1306 disposed along a second direction, and the scan line 1306 intersects with the data line 1304 . The pixel structure 1308 also has a thin film transistor 1302 with a gate 1302b, a source 1302a and a drain 1302c. The gate 1302b is electrically connected to the scan line 1306, the source 1302a is electrically connected to the data line 1304, and the drain 1302 is electrically connected to the contact hole 1314. connected to the pixel electrode 1310 . The pixel structure 1308 further includes a shielding electrode 1312, which has a main shielding electrode 1312a parallel to the data line 1304 and covering part of the pixel electrode 1310, and further includes a shie...
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