Method for manufacturing circuit device
A manufacturing method and circuit device technology, which can be applied in the direction of multilayer circuit manufacturing, circuit, semiconductor/solid-state device manufacturing, etc., can solve the problem of the overall size of the semiconductor device becoming larger.
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[0031] The manufacturing method of the circuit device of the present invention includes the following steps: a step of forming a conductive pattern 21 formed on the conductive foil 10 with a separation groove 11 formed on the surface and connected as a whole by the bottom; a step of installing a circuit element 22 at a predetermined position of the conductive pattern 21; In the step of sealing with the sealing resin 28 to cover the circuit element 22 and filling the separation groove 11 , the surface of the conductive foil 10 is irradiated with plasma to manufacture a circuit device. There are two methods of irradiating plasma. The first method is to irradiate plasma before mounting circuit element 22 , and the second method is to irradiate plasma after mounting circuit element 22 . Each of these steps will be described in detail below.
[0032] The first process of the present invention is, as Figure 1 ~ Figure 3 As shown, the process of forming the conductive pattern 21 on...
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