Virtual measurement prediction generated by semi-conductor, method for establishing prediction model and system

A predictive model and measurement technology, applied in semiconductor/solid-state device manufacturing, general control systems, control/regulation systems, etc.

Inactive Publication Date: 2008-02-06
POWERCHIP SEMICON CORP
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0004] The traditional measurement method will lead to many application problems due to the difference in sampling, for example, the batch control between two wafer batches

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  • Virtual measurement prediction generated by semi-conductor, method for establishing prediction model and system
  • Virtual measurement prediction generated by semi-conductor, method for establishing prediction model and system
  • Virtual measurement prediction generated by semi-conductor, method for establishing prediction model and system

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Embodiment Construction

[0022] In order to make the purpose, features, and advantages of the present invention more comprehensible, preferred embodiments will be described below in detail with reference to FIGS. 1 to 6 of the accompanying drawings. The description of the present invention provides different examples to illustrate the technical features of different implementations of the present invention. Wherein, the configuration of each component in the embodiment is for illustration, not for limiting the present invention. In addition, part of the reference numerals in the embodiments are repeated for the purpose of simplifying the description, and do not imply the correlation between different embodiments.

[0023] The embodiment of the present invention discloses a method and system for virtual measurement estimation and estimation model establishment in semiconductor manufacturing.

[0024] To obtain detailed process equipment performance data, a large number of high-resolution system variab...

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Abstract

The present invention discloses a method for creating a pre-estimation model. The method is to choose the varying detecting value of a plurality of real time technique states, and collect error detecting and categorical data as well as quality control data according to different techniques. The data control quality is judged whether the data control quality measures up to standard. When the data control quality does not measure up to standard, the error detecting and categorical data and the quality control data are recollected, or the sampling frequency is trimmed. When the data control quality measures up to standard, the error detecting and categorical data and the quality control data are processed. A plurality of pre-estimation models is created according to the data processing result, an optimum pre-estimation model is chosen according to a pertinence indicating hand to validate the pre-estimation model, and optimum pre-estimation model is trimmed. When the trimming is finished and the optimum pre-estimation model is in the optimum state, the optimum pre-estimation model is delivered to a dummy measure engine.

Description

technical field [0001] The invention relates to a quality control method for semiconductor manufacturing, in particular to a method and system for virtual measurement estimation and estimation model establishment in semiconductor manufacturing. Background technique [0002] Statistical Quality Control (SQC) is a technology to maintain and improve product quality, and Statistical Process Control (SPC) is one of the main tools, which focuses on the analysis of data in the manufacturing process , to determine the cause of product variation. Statistical quality management consists of two main parts, namely statistical process control and sampling acceptance criteria. Statistical process control includes quality control (QC) processing and the basic theory and application of probability and statistics. SPC is the use of process operation variables to predictively monitor production variables or product quality variables, and there is a certain time lag in the process from the c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G05B17/00G05B19/00H01L21/00G06Q10/00
Inventor 戴鸿恩罗皓觉
Owner POWERCHIP SEMICON CORP
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