2 results about "Statistical quality" patented technology

In a single-wafer heat treatment furnace, the lift speed is appropriately controlled to perform heat treatment on semiconductor wafers, taking into consideration both quality standards and productivity. [Solution] The method for manufacturing a heat-treated semiconductor wafer involves creating a database of relationships between one or more statistical quality parameters selected from the group consisting of flatness, light point defect, lift pin mark area, and lift pin mark height, and lift operation parameters; calculating process capability parameters for lift operation parameter combinations based on the standard information of one or more quality parameters selected from the group and the database; determining whether multiple lift operation parameter combinations pass or fail based on the calculation results; selecting lift operation parameter combinations from among those determined to pass, selecting lift operation parameter combinations whose total lift operation time is less than or equal to a threshold; setting the lift speed in a single-wafer heat treatment furnace with variable settings; and heat-treating the semiconductor wafer in the furnace.