Exposure device
A technology of equipment and exposure unit, which is applied in the direction of microlithography exposure equipment, photoplate making process exposure device, etc., and can solve the problem of low reliability of stable temperature
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no. 1 example
[0116] 1-5 show an exposure apparatus of a first embodiment of the present invention. 6 and 7 show a transfer table for photosensitive material transfer, which is provided at the exposure apparatus of this embodiment.
[0117] As shown in FIGS. 1-5 , the exposure apparatus 10 has a structure in which an apparatus main body 20 is accommodated in a large cover body 12 . In the illustrated state, the exposure apparatus 10 is set in an air-conditioned environment such as a clean room in which temperature and humidity are controlled and dust, microscopic particles, etc. floating in the air in the room are removed , in order to maintain a high degree of air cleanliness.
[0118] The cover body 12 has a structure in which a plurality of panels 16 isolating the inside and the outside are installed on the frame main body, and the frame is formed by installing rod-shaped angle pipes (angle pipes) 14 in a frame form (see FIG. 5 ). main body. The lower surface portion of the cover body...
no. 2 example
[0204] The features of the second embodiment include the adjustment air flow control technique in the exposure apparatus 10 related to the first embodiment, which controls the air regulator 80 and changes corresponding to the movement of the transfer table 28 in the exposure operation. The air conditioning air flow amount (air conditioning airflow amount). Next, the air conditioning operation (air conditioning air volume control operation) of the exposure apparatus 10 related to the second embodiment will be described.
[0205] In the present embodiment, the controller 100 controls the air conditioner 80 and changes the amount of air conditioning air corresponding to the movement of the transfer table 28 in the exposure operation.
[0206] More specifically, as shown in FIG. 11 , when the transfer table 28 is set at the origin position (the position farthest from the outlet 82B of the duct 82 ), the flow rate of the cooling air blown by the air conditioner 80 to the duct 82 be...
no. 3 example
[0210] The third embodiment is characterized by a change in the structure of the duct for supplying cooling air from the air conditioner 80 to the exposure chamber 15 in the exposure apparatus 10 related to the first embodiment. The structure of the exposure apparatus of the third embodiment will be described below.
[0211] As shown in FIG. 13, in this embodiment, there is no gas flow direction changing plate 90 described in the first embodiment in the exposure chamber 15, but the distal portion 110A of the conduit 110 is arranged on the rear wall 15C of the cavity 15B, Duct 110 guides cooling air from air conditioner 80 into exposure chamber 15 .
[0212] The distal end portion 110A of the catheter 110 of this embodiment is formed in a straight line and arranged approximately horizontally, and the catheter 110 protrudes slightly inward through the rear wall surface 15C of the recess 15B. Further, the outflow port 110B is oriented toward the blocking plate 96 and configured ...
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