Chemical etching liquor for aluminium and aluminum alloy

Abstract

The invention discloses a chemical etching solution for aluminium and aluminium alloy. The chemical etching solution consists of hydrochloric acid, nitric acid, ferric ionic compound and water, wherein, the weight percentage concentration of the hydrochloric acid is 1-3 percent, the weight percentage concentration of the nitric acid is 4-6 percent, and the concentration of the ferric ion is 30-70 g / l. The chemical etching solution can be used repeatedly by adding a kind of oxidizing solution, such as sodium chlorate solution. The chemical etching solution of the invention has the advantages of fast etching speed, excellent etching uniformity, repeatedly using availability, no grey residue after etching, low manufacturing cost, etc.

Description

technical field [0001] The invention relates to a chemical etching solution, in particular to a chemical etching solution suitable for aluminum and aluminum alloys. Background technique [0002] Chemical etching is the process of quickly dissolving and removing unwanted metals by using the corrosive action of chemical solutions. The basic process of chemical etching is: the initial metal parts are routinely cleaned and degreased to make the surface clean, and then the masking layer is coated on the surface, and part of the masking layer is removed by laser or other engraving methods according to the pattern to be processed. The masking layer If it is photoresist, the photoresist is removed by exposure, and the exposed metal is corroded by chemical etching solution. After the etching process is completed, the masking layer on the surface is removed, and finally cleaned with water to obtain the etched workpiece product. [0003] At present, the common aluminum and aluminum al...

AI Technical Summary

Problems solved by technology

[0003]Currently common aluminum and aluminum alloy chemical etching solutions on the market are generally matched with aqueous solutions composed of acetic acid, phosphoric acid and nitric acid. The disadvantage of this etching solution is that the etching speed is slow , The uniformity of etching is poor, and the utilization rate of etching solution is low. Generally, the etching solution is no longer usable after being used once, and gray residue is left after etching and the cost is high.