Method for removing pollutant on the substrate surface by high-density phase fluid
A substrate surface, high-density phase technology, applied in non-surface-active detergent compositions, organic non-surface-active cleaning compositions, chemical instruments and methods, etc. The cleaning effect cannot be improved, etc., to achieve the effect of removing substrate photoresist and residues
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0044] seefigure 1 figure 2 , the present invention is a method for removing pollutants on the surface of a substrate with a high-density fluid. The method S1 for removing pollutants on the surface of a substrate with a high-density fluid includes step S10, providing a pressure vessel; step S20, providing a substrate; step S30 , providing a high-dense phase solution; Step S40, performing substrate spraying (Spray) operations; Step S50, performing substrate pollutant removal operations; Step S60, performing immersion and rinsing (Rinse) the substrate surface; Step S70, and performing substrate removal operations .
[0045] see again figure 1 and figure 2 , the present invention is a method for removing pollutants on the surface of a substrate with a high-dense phase fluid. The method S1 for removing pollutants on the surface of a substrate with a high-density phase fluid is to first perform step S10 to provide a pressure vessel. The pressure vessel 10 includes a body 11 an...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com