Method for removing pollutant on the substrate surface by high-density phase fluid

A substrate surface, high-density phase technology, applied in non-surface-active detergent compositions, organic non-surface-active cleaning compositions, chemical instruments and methods, etc. The cleaning effect cannot be improved, etc., to achieve the effect of removing substrate photoresist and residues

Inactive Publication Date: 2008-07-02
METAL INDS RES & DEV CENT
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

[0006] The technical problem to be solved by the present invention is to provide a method for removing residues on the surface of the substrate with a high-density phase fluid, which is used to solve the existing method for removing residues on the surface of the substrate. Because the solvent is not easily brought into the groove of the substrate, the substrate It also overcomes the disadvantage of poor effect of removing residues, and also overcomes the disadvantage that the cleaning solvent in the prior art is not uniform when in contact with residues, so that the cleaning effect of residues on the substrate surface cannot be improved

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  • Method for removing pollutant on the substrate surface by high-density phase fluid
  • Method for removing pollutant on the substrate surface by high-density phase fluid

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Embodiment Construction

[0044] seefigure 1 figure 2 , the present invention is a method for removing pollutants on the surface of a substrate with a high-density fluid. The method S1 for removing pollutants on the surface of a substrate with a high-density fluid includes step S10, providing a pressure vessel; step S20, providing a substrate; step S30 , providing a high-dense phase solution; Step S40, performing substrate spraying (Spray) operations; Step S50, performing substrate pollutant removal operations; Step S60, performing immersion and rinsing (Rinse) the substrate surface; Step S70, and performing substrate removal operations .

[0045] see again figure 1 and figure 2 , the present invention is a method for removing pollutants on the surface of a substrate with a high-dense phase fluid. The method S1 for removing pollutants on the surface of a substrate with a high-density phase fluid is to first perform step S10 to provide a pressure vessel. The pressure vessel 10 includes a body 11 an...

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Abstract

The invention relates to a method for removing pollutants from the surface of a base plate by high dense-phase fluid, which comprises the steps that a pressure container is provided; a base plate is provided; high dense-phase solution is provided; spray rinsing work of the base plate is carried out; pollutants removing work of the base plate is carried out; the surface of the base plate is soaked and washed and the base plate is taken out. Through the implementation and application of the invention, the solution can effectively enter the interior of a groove of the base plate, and lead washing solvent evenly to be contacted with the pollutants so as to promote the effect of removing pollutants on the base plate.

Description

technical field [0001] The present invention relates to a method for removing surface pollutants from a substrate with a high-density phase fluid, in particular to a method for removing surface pollutants from a substrate with a high-density phase fluid that can effectively improve the residue removal effect of the substrate. Background technique [0002] The physical properties of the commonly used supercritical fluid are between gas and liquid phases. If its viscosity is close to that of gas and its density is close to that of liquid, because of its high density, it can transport more fluid than gas; because of its low viscosity, it can transport The required power is lower than that of liquid. For another example, the diffusion coefficient is 10 to 100 times higher than that of liquid, that is, the mass transfer resistance is much smaller than that of liquid, so the mass transfer is faster than that of liquid. In addition, supercritical fluids are more like gases and hav...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00C11D7/50C11D7/32C11D7/24C11D7/26
Inventor 杨宗鑫洪俊宏吴茂宾连培荣
Owner METAL INDS RES & DEV CENT
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