X-ray analysis apparatus and x-ray analysis method
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HITACHI HIGH TECH SCI CORP
- Publication Date
- 2008-07-30
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to an X-ray analysis apparatus and an X-ray analysis method suitable for use in, for example, energy dispersive fluorescence X-ray analysis and the like. Background technique
[0002] In fluorescent X-ray analysis, by irradiating X-rays emitted from an X-ray source to a sample and detecting fluorescent X-rays, which are characteristic X-rays irradiated from a sample, by an X-ray detector, thereby from The energy of the fluorescent X-rays can be used to obtain an energy spectrum, thereby performing qualitative or quantitative analysis on the sample. This fluorescent X-ray analysis is widely used in process / quality control because it can quickly analyze a sample without destroying the sample. In recent years, efforts have been made to improve the accuracy / sensitivity and trace measurement thus becomes possible, making it desirable to develop an analysis technique particularly for detection of harmful substances contained in...