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Fault detection and classification (FDC) using a run-to-run controller

一种控制器、故障状态的技术，应用在通用控制系统、程序控制、全面工厂控制等方向，能够解决FDC系统和R2R控制器集成未被实现等问题

Active Publication Date: 2008-09-03
TOKYO ELECTRON LTD
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  • Abstract
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  • Application Information

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Problems solved by technology

Therefore, to the applicant's knowledge, the integration of FDC systems and R2R controllers has never been achieved before

Method used

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  • Fault detection and classification (FDC) using a run-to-run controller
  • Fault detection and classification (FDC) using a run-to-run controller

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Embodiment Construction

[0020] The development of semiconductor processing technology requires the provision of run-to-run (R2R) control at the tool level of semiconductor processing equipment. For stable and robust control of the process, fault detection and classification also needs to be provided at the semiconductor processing equipment tool level. However, simple fault detection techniques are incompatible with R2R control and have the potential to generate frequent false alarms. Advanced process control integrated systems including data collection, data analysis, FDC, R2R control, automatic DOE, SPC charting, PCA and PLS analysis can be used to provide the accurate and reliable process control required by manufacturers of high-performance semiconductor integrated circuits.

[0021] figure 1 An exemplary block diagram of a processing system according to an embodiment of the invention is shown; in the illustrated embodiment, the processing system 100 includes a processing tool 110, a controller...

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Abstract

The present invention provides a method for implementing FDC in an APC system including receiving an FDC model from memory; providing the FDC model to a process model calculation engine; computing a vector of predicted dependent process parameters using the process model calculation engine; receiving a process recipe comprising a set of recipe parameters, providing the process recipe to a process module; executing the process recipe to produce a vector of measured dependent process parameters; calculating a difference between the vector of predicted dependent process parameters and the vector of measured dependent process parameters; comparing the difference to a threshold value; and declaring a fault condition when the difference is greater than the threshold value.

Description

[0001] Cross References to Related Applications [0001] This application is related to US Application No. 10 / 962,596, filed October 13, 2004, which is hereby incorporated by reference in its entirety. technical field [0002] The present invention relates to semiconductor wafer processing. More specifically, the present invention relates to performing fault detection and classification (FDC) using a run-to-run controller. Background of the invention [0003] New developments in advanced process control (APC) in the field of semiconductor processing equipment (SPE) or tools used by semiconductor fabrication facilities (fabs) in the production of high-performance integrated circuits, including fault detection and classification (FDC) The purpose is to complement the monitoring hardware and software at the tool level (TL). FDC provides the ability to establish a baseline of tool operation, as well as the ability to detect faults and classify or determine the root cause of p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F19/00
CPCG05B19/4184G05B2219/31356G05B2219/32179G05B2219/45031Y02P80/40Y02P90/02Y02P90/80H01L22/00
Inventor 詹姆斯·E·威利斯麦尔特·凡克凯文·拉利凯文·彼恩托友安昌幸雷蒙德·彼得森哈达·桑达哈简
Owner TOKYO ELECTRON LTD
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