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Preparation exhaust device for slit coating machine

A discharge device and coating machine technology, applied to the surface coating liquid device, optical mechanical equipment, photo-plate making process coating equipment, etc., can solve the problems of reduced cleaning efficiency and consumption of solution on the surface of the roller

Active Publication Date: 2008-11-12
K C TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] However, when the solution is supplied to the surface of the roller by spraying the nozzle or by simply dropping it as described above, a part of the solution cannot be supplied to the surface of the roller correctly and scatter and flow to the outside or other areas, resulting in consumption of a larger amount of solution, and the solution cannot be uniform. Coating to the entire roller results in less efficient cleaning of the roller surface

Method used

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  • Preparation exhaust device for slit coating machine
  • Preparation exhaust device for slit coating machine
  • Preparation exhaust device for slit coating machine

Examples

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Embodiment Construction

[0025] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.

[0026] image 3 is a sectional view of a preliminary discharge device for a slit coater according to an embodiment of the present invention.

[0027] refer to image 3 It can be seen that the pre-discharging device for a slit coater according to the embodiment of the present invention includes: a rotatable roller 310 and an accommodating portion 320 that rotatably supports the roller 310 and exposes a part of the accommodated roller 310 to the outside. The roller 310 receives the photosensitive liquid to be discharged through the slit nozzle 200 , and the storage part 320 is provided with a cleaning tank 330 filled with a cleaning solution 332 in order to clean the surface of the roller 310 receiving the photosensitive liquid.

[0028] At this time, the roller 310 is rotatably installed in the storage part 320 in the form that a part of its outer s...

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PUM

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Abstract

The invention relates to a pre-discharger for a silt coating machine, comprising: a roller that receives photosensitive liquid pre-discharged from a silt nozzle; an accepting part that rotatablely supports the roller and expose part of the accepted roller to the outside; a cleaning part arranged closely along an outer surface of the roller, which comprises a solution supply pipe that supplies solution to dilute the photosensitive liquid; an inclined plate that enables the solution supplied by the solution supply pipe to flow to a surface of the roller; a plurality of scrapers in contact with an outer surface of the roller to remove impurity. According to the invention, the solution supplied by the solution supply pipe is provided to the roller side via the inclined plate so as to obviously reduce solution waste compared with former manner of jetting or pure dripping, and implement uniform coating of the solution on the surface of the roller; therefore, the invention can further enhance cleaning effect of photosensitive liquid on the surface of the roller.

Description

technical field [0001] The present invention relates to a preliminary discharge device for a slit coater, and more particularly, to a preliminary discharge device for a slit coater capable of uniformly supplying a solution for removing photosensitive liquid coated on the surface of a roller to the surface of a roller . Background technique [0002] Usually, in the manufacturing process of semiconductor equipment or flat panel display (FPD: flat panel display), in order to make thin films that perform specific functions on the substrate (silicon wafer or glass substrate) to be processed, such as oxide thin films, metal thin films, semiconductor thin films, etc. Patterning in a desired shape is carried out, and a process of applying a sensitive material that reacts with a light source onto the film is performed. [0003] As mentioned above, in order to form a predetermined loop pattern on the thin film of the substrate to be processed, apply a photosensitive liquid to form a ...

Claims

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Application Information

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IPC IPC(8): G03F7/16B05C5/02
CPCG03F7/70925H01L21/67051H01L21/6715
Inventor 郑恩米尹承韩
Owner K C TECH
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