Anti-leakage type photoresist bottle

Abstract

The invention relates to a dripproof photoresistive bottle used for providing a flow-controllable corrosive photoresist for an etching process in the IC (integrated circuit) manufacturing process. The structure of the photoresistive bottle comprises a bottle body, a bottle cover, an intake pipe and an outlet pipe, and the bottle body is connected with the bottle cover through threads, and the intake pipe and outlet pipe are communicated with the internal part of the bottle body through the bottle cover. The photoresistive bottle is characterized in that a retractable tube is arranged between the bottle cover and the bottle body, and simultaneously, the outlet pipe is divided into a liquid-absorbing section and a liquid-draining section which are respectively connected with an upper end and a lower end of the retractable tube, and after connection the internal parts of the three parts are mutually communicated to form a half-way sealed liquid absorbing-draining path. The photoresistive bottle of the invention can effectively prevent the photoresist from leaking to the outside of the bottle in an operation process so as to solve the problem that the work environment is often contaminated and the contaminated environment is difficult to be cleaned.

Description

technical field [0001] The invention relates to a liquid agent container, in particular to a photoresist bottle for controlling the flow rate of the liquid agent in the bottle through external pressure. Background technique [0002] With the rapid progress of integrated circuit technology, the degree of integration is constantly increasing, and the chip area is constantly shrinking, which also puts forward higher requirements for the manufacturing process of integrated circuits. After decades of repeated research, practice, improvement, and practice, today's IC process technology has reached a relatively mature level. "Etching", as an important part of the current IC manufacturing process, is playing an increasingly important role in improving the integration of integrated circuits. In this process, photoresist is an indispensable preparation material for this process. The etching is completed by covering, exposing, developing and removing the photoresist to provide the pos...

AI Technical Summary

Problems solved by technology

However, when the traditional photoresist bottle is replaced or replenished, the residual photoresist in the liquid outlet pipe will drop to the raised floor under the action of gravity, causing damage to the working environment

And the photoresist is corrosive, once the working environment is polluted, subsequent cleaning will be very troublesome

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