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Double light beam interference adjustable gain laser writing filtering method and apparatus

A double-beam interference and filtering device technology, applied in optics, optical components, instruments, etc., can solve the problems that affect the quality of the writing spot, cannot change the line width and focal depth range, and achieve both quality and writing efficiency Effect

Inactive Publication Date: 2010-08-25
南通巨大机械制造有限公司
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The technical feature of the existing filtering method is that after the filter element parameters are made, the lateral and axial intensity distribution characteristics of the laser writing spot are in a fixed mode, and the line width and focal depth range cannot be changed during the application process.
In terms of laser writing filtering technology, currently retrieved technologies mainly realize lateral and axial intensity distribution modulation through amplitude, phase or complex amplitude filters. These technologies use beam interception or absorption to realize amplitude transmittance modulation. It is easy to generate stray light, which affects the quality of writing spot

Method used

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  • Double light beam interference adjustable gain laser writing filtering method and apparatus
  • Double light beam interference adjustable gain laser writing filtering method and apparatus
  • Double light beam interference adjustable gain laser writing filtering method and apparatus

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Abstract

The invention discloses a double-beam interference gain-adjustable laser writing filtering device, which comprises a light-dividing device, a first phase modulation device, a second phase modulation device, a fixed reflection device, an adjustable reflection device, and an adjustable focus objective. The good effect of the invention lies in that the adjustable writing of the horizontal main lobe width and the axial focal depth range of a laser writing spot is realized, in a working process, the distribution characteristics of the horizontal or axial spot intensity can be changed according to the structural features of elements needing to be manufactured, thus being beneficial for considering both the writing quality and the writing efficiency of the laser writing.

Description

technical field The invention belongs to the field of precision manufacturing of microstructured optical elements, and is a three-dimensional laser writing technology that realizes the adjustable width of the transverse main lobe of the laser writing spot and the range of the axial focal depth. Background technique The essence of laser writing technology is to record graphics or data by focusing laser beams, so as to produce microstructured optical elements. The width of the transverse main lobe and the axial depth of focus of the laser writing spot are important technical parameters of laser writing. The width of the transverse main lobe affects the etching line width, and the axial depth of focus affects the etching depth. The modulation of the width of the transverse main lobe can be divided into two types: super-resolution (the width of the main lobe is smaller than the Airy disk, and the intensity of the side lobes is enhanced) and apodization (the width of the main lob...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B27/48
Inventor 刘俭谭久彬
Owner 南通巨大机械制造有限公司
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