The application discloses an
exposure writing field splicing method of an
electron beam spherical
grating, and the splicing process comprises the following steps: calculating the writing
field size; calculating the writing field splicing interval of the spherical
grating; focusing on a spherical reference point and locally exposing; identifying the writing field splicing error; adjusting and controlling the writing field splicing error; modifying and compensating the consistency of the writing
field pattern of each region of the spherical
grating; and exposing by the
electron beam after converting the error of the whole region writing field. The
exposure writing field splicing method of the
electron beam spherical grating provided by the application guarantees the consistency of the writing field splicing and the pattern of each region of the spherical grating, reduces the
surface roughness of the electron beam spherical grating, avoids the appearance of the secondary peak of the imaging
Airy disk caused by the splicing error, and guarantees the
imaging quality and the
spectral resolution of the spectral instrument.