Antiblocking photocurable resin composition, antiblocking structure coating the same on substrate and production method thereof

A curable resin and anti-blocking technology, applied in the direction of coating, layered products, etc., can solve the problems of deterioration of coating film properties, vulnerability to damage, and damage to photochemical properties

Inactive Publication Date: 2009-01-14
NIPPON PAINT CO LTD
View PDF5 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When particles are mixed, the film thickness must be thinned in order to form unevenness on the surface, so the film strength is weakened, it is easily damaged, and the coating film characteristics deteriorate
Also compromised photochemical properties

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Antiblocking photocurable resin composition, antiblocking structure coating the same on substrate and production method thereof
  • Antiblocking photocurable resin composition, antiblocking structure coating the same on substrate and production method thereof
  • Antiblocking photocurable resin composition, antiblocking structure coating the same on substrate and production method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0160] 1 part by weight of the acrylic copolymer of Preparation Example 1 (SP value of the resin: 10.2, Tg: 113° C., weight average molecular weight Mw = 5200) as the first component, 99 parts by weight of Aronix M305 (Toagosei Co., Ltd. pentaerythritol triacrylate, SP value: 12.7), as a silicone compound 0.1 parts by weight FM-7711 (Chitsuso Co., Ltd. reactive silicone, number average molecular weight Mn = 1000), 7 parts by weight 2-Methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, which is a photoinitiator, is mixed in isopropanol as a solvent to make a non-volatile component rate up to 40% by weight of the solution.

[0161] The solution was coated on a PET film substrate (100 μm) with a bar coater (No.10) at 23°C, dried at 80°C for 1 minute to form a film with a thickness of 5 μm, dried to remove the solvent, and then irradiated with an ultra-high pressure mercury lamp Ultraviolet (350nm), energy up to 300mJ / cm 2, to solidify the film. For the obtained anti-bloc...

Embodiment 2-9

[0190] In the same manner as in Example 1, the antiblocking layered structures of Examples 2 to 9 were prepared and evaluated in the same manner as in Example 1. Tables 1 and 2 show the results. In embodiment 2-9, change the acrylic copolymer used in embodiment 1 into listed in the table, used monomer, silicone compound, use and embodiment 1 identical, embodiment 5 and In Example 9, the following silica particles were used, and in Example 6, the following acrylic particles were used.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
glass transition temperatureaaaaaaaaaa
particle sizeaaaaaaaaaa
heightaaaaaaaaaa
Login to view more

Abstract

The invention relates to a lability antiblocking light-settability resin composition, a solidified antiblocking structure coated on basis materials and a preparation method. The invention provides a film which prevents adhension between laminas of thermoplastic films, namely blocking, and a sandwich, a technology for improving glidability. The lability antiblocking light-settability resin composition of the invention comprises a first component, a second component and silicone compound, wherein the first component includes at least one resin, the second component includes more than one selected from more than one monomer or oligomer, after coating the composition, the resin of the first component is separated due to separation, and minute sagging is formed on the surface.

Description

technical field [0001] The present invention relates to a curable resin composition having antiblocking properties, a hard coat film, a layered structure, and methods for producing them. Background technique [0002] When hard coating is performed on a thermoplastic film such as a PET film, it is wound up and stored in a roll form during the production process. When other layers are stacked on a resin base layer such as a PET film forming a hard coat layer, the layers will be in an adherent state due to adhesive force or chemical force, and when using each layer, it will take a lot of effort to peel off Each layered body is difficult to peel off due to its strong adhesive force, or when it is forcibly peeled off, the layered body is destroyed. [0003] In this case, a back coat is formed by coating and kneading a coating containing particles such as silica of about 1 μm on the other side of the substrate that has not been hard-coated, and by providing unevenness on the surf...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08F290/08C08F2/50C09D4/00C08J7/04B32B33/00
CPCC08J5/18C08J7/04C08K5/5425C08L83/04
Inventor 山道靖二上田浩一
Owner NIPPON PAINT CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap