High resolution heterodyne laser interference system and method for improving definition

A laser interference and high-resolution technology, which is applied in the direction of optical devices, microlithography exposure equipment, photolithography exposure devices, etc., can solve the problems affecting the measurement accuracy of the interferometer and achieve the effect of improving the measurement accuracy

Active Publication Date: 2009-01-14
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF1 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, since both the incident beam and the outgoing beam in the optical path need to pass through the beam conve

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High resolution heterodyne laser interference system and method for improving definition
  • High resolution heterodyne laser interference system and method for improving definition
  • High resolution heterodyne laser interference system and method for improving definition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The invention will be further described below in conjunction with the accompanying drawings.

[0030] Please refer to figure 2 , figure 2 It is a flow chart of the method for improving interferometer resolution in the present invention, from figure 2 We can find out that the method for improving interferometer resolution of the present invention comprises the following steps: Step 10: produce the laser beam used during measurement; Step 11: pass through the second beam splitter, be divided into transmitted light and reflected light; Step 12: transmitted light After passing through the third quarter-wave plate, it hits the movable plane reflector and reflects back to the first measurement light; Step 13: The reflected light passes through the second quarter-wave plate and then hits the second reference plane reflector for reflection Back to the first reference light; step 14: the first measurement light and the first reference light pass through the first spectrosco...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a high-resolution heterodyne laser interferometer system and a method for increasing the resolution, the method comprises that: a laser beam which is used during measurement is generated, the laser beam is divided into transmission light and reflection light by a beam splitter, the transmission light is incident on a movable planar reflection mirror by a third quarter-wave plate, the first measurement light is reflected back, the reflection light is incident on a second reference planar reflection mirror by a second quarter-wave plate, the first reference light is reflected back, the first measurement light and the first reference light form respective emergent light by a plurality of transmission and reflection by an interferometer, the emergent light is received by a signal processing unit, the round trip times of the measurement light beam between the interferometer and the movable planar reflection mirror can be controlled by adopting different numbers of cube-corner prisms, thereby realizing the purpose of increasing the resolution.

Description

technical field [0001] The invention relates to a dual-frequency laser interference system and a method for improving resolution, and in particular to a high-resolution heterodyne laser interference system and a method for improving resolution. Background technique [0002] The heterodyne laser interferometer is widely used in the precise positioning of the workpiece stage and the mask stage of the lithography machine because of its high resolution and high precision. With the improvement of the positioning accuracy of the workpiece stage and the mask stage, higher requirements are put forward for the accuracy of the heterodyne laser interferometer. The resolution of heterodyne laser interferometer is the key factor affecting its measurement accuracy. Therefore, improving the resolution of the heterodyne laser interferometer is an important guarantee for improving its measurement accuracy. [0003] Patent 200410053441.4 provides an optical eight subdivision dual-frequency ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01B9/02G01D5/26G03F7/20
Inventor 马明英
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap