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Lithographic apparatus and device manufacturing method, and measurement systems

A technology of lithography equipment and radiation system, applied in the field of lithography equipment, can solve the problem that the encoder system is not suitable for the purpose of measuring the substrate platform

Inactive Publication Date: 2009-04-01
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the movement of the substrate stage in its x and y directions is significantly greater than 1 mm, and the movement of the reticle stage in at least its y direction is significantly greater than 1 mm, known encoder systems are not adapted to the substrate stage and / or The purpose of measuring the Z displacement of the reticle platform

Method used

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  • Lithographic apparatus and device manufacturing method, and measurement systems
  • Lithographic apparatus and device manufacturing method, and measurement systems
  • Lithographic apparatus and device manufacturing method, and measurement systems

Examples

Experimental program
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Embodiment 1

[0109] figure 1 A lithographic apparatus according to a specific embodiment of the invention is schematically described. The equipment includes:

[0110] Radiation system Ex, IL for providing projection radiation beam PB (eg laser radiation). In this particular case, the radiation system also includes a radiation source LA;

[0111] A first stage (mask stage) MT equipped with a mask holder to support the mask MA (e.g. a reticle) and is connected to a first stage for precise positioning of the mask relative to the item PL. positioning device PM;

[0112] A second stage (substrate stage) WT equipped with a substrate holder to support a substrate W (e.g., a resist-coated silicon wafer) and connected to a Precise positioning of the second positioning device PW; and

[0113] A projection system ("lens") PL is used to image the irradiated mask MA onto a target portion C of the substrate W (eg, comprising one or more dies). As described herein, the device is reflective (ie, has ...

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PUM

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Abstract

The invention pertains to a lithographic apparatus including a radiation system configured to condition a beam of radiation; a projection system configured to project the beam of radiation onto a target portion of a substrate; a displacement device configured to move the moveable object relative to the projection system in substantially a first direction and a second direction differing from the first direction; and a measuring device configured to measure a displacement of the moveable object in a third direction, which is substantially perpendicular to the first direction and to the second direction, wherein the measuring device may include an encoder system.

Description

technical field [0001] The invention relates to a lithographic apparatus comprising: [0002] - Radiant systems, which provide projected radiation beams; [0003] - a support structure for supporting a patterning device for patterning the projected beam of wires in a desired pattern; [0004] - a substrate platform for carrying the substrate; and [0005] - A projection system for projecting the patterned beam onto a target portion of the substrate. The invention also relates to a measurement system. Background technique [0006] The term "patterning device", as used herein, should be broadly interpreted as referring to a device that can impart a pattern cross-section to an incident radiation beam in accordance with a pattern to be established on a target portion of a substrate; valve" term. Typically the pattern corresponds to a specific functional layer to be built in a target portion of the device, such as an integrated circuit or other device (see below). Examples ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/027G01B11/00
CPCG03F7/70775G03F7/70483H01L21/67259
Inventor M·H·M·比姆斯E·A·F·范德帕斯奇
Owner ASML NETHERLANDS BV