Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Optical mask for exposure

A photomask, film-like technology, applied in microlithography exposure equipment, originals for photomechanical processing, photolithography process exposure devices, etc. and other problems, to achieve the effect of reducing parts and reducing production costs

Inactive Publication Date: 2009-07-15
SANEI GIKEN
View PDF1 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] The problem caused by the enlargement of the photomask is not only the increase in the cost of making the photomask
In addition, larger photomasks cannot correspond to existing photomask drawing devices.
In order to obtain a compatible drawing device, investment in new equipment is required

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical mask for exposure
  • Optical mask for exposure
  • Optical mask for exposure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0041] figure 1 It is a plan view of the photomask 1 according to an embodiment of the present invention. The photomask 1 includes a central part 3 in which a pattern including a plurality of alignment marks 2 is drawn, and a force transmission part 4 which is arranged so as to surround the outer peripheral edge of the central part 3 as a whole. The force transmission part 4 and the central part 3 are made independently.

[0042] The central portion 3 can be divided into an area surrounded by a two-dot chain line D, that is, a pattern display area 5 when a pattern is drawn therein, and an installation area 6 surrounding the area. The central portion 3 is composed of the same or equivalent material as the material forming the existing photomask.

[0043] In this embodiment, as figure 2 As shown, the force transmission part 4 is composed of 4 belt-shaped members 4a-4d independently made on each side of the central part 3. The respective belt-shaped members 4a-4d are joined to each...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a photomask, which is formed by dividing the photomask into a central part depicted with patterns and its surrounding force transfer parts, then bonding, so that it can reduce material costs and avoid investment in new facilities. The photomask (1) is divided into a central part(3) including a pattern display area (5), and a force transmission part (4) surrounding the outer peripheral part of the central part (3). The two parts are mutually jionted by the adhesive tape (7). The force transmission part (4) has a jiont part(hole) (8) connected to a force endowing mechanism, for perform elastic deformation to the central part (3).

Description

Technical field [0001] The present invention relates to a photomask, which is used in an exposure method. In the exposure method, the photomask is elastically deformed by applying force to the periphery of the film-shaped photomask, thereby changing the The size and / or shape of the pattern including a plurality of alignment marks drawn on the above, so that after the photomask and the substrate are aligned, the pattern is transferred to the substrate. Background technique [0002] The above-mentioned exposure method is disclosed in Japanese Patent No. 3402681. based on Figure 5 and Figure 6 Explain its principle. As shown in the figure, a plurality of actuators 102 are provided around the photomask 101 as force applying mechanisms for applying tensile force to the peripheral edge of the photomask 101. The actuator 102 is mounted on the base member 103 so as to surround the photo mask 101. A hook 105 is formed on the movable end 104 of the actuator 102. [0003] On the other han...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F1/00G03F1/14G03F7/20G03F1/60
CPCF21V17/10G02F1/1336G02F2201/46
Inventor 高木俊博
Owner SANEI GIKEN
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com