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Layout designing method and apparatus

A layout design and layout technology, applied in the field of layout design methods and devices, can solve problems such as layout design rule errors, and achieve the effects of improving efficiency, ensuring reliability, and saving the process of combined splicing and inspection.

Inactive Publication Date: 2009-08-05
修思(北京)电影科技有限公司
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Problems solved by technology

[0007] In view of this, the purpose of the embodiments of the present invention is to provide a layout design method and device to solve the problem of design rule errors in the layout caused by splicing the layout

Method used

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  • Layout designing method and apparatus
  • Layout designing method and apparatus
  • Layout designing method and apparatus

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Embodiment Construction

[0048] Embodiments of the present invention provide a layout design method and device. When performing system layout design, firstly, according to the design rules provided by the process manufacturer, the layout splicing design rules related to the layout frame are set, and the process can be used in the single sub-layout design stage. The design rules provided by the manufacturer and layout splicing design rules check the design rule errors that may be caused by layout splicing, which belongs to active error correction.

[0049] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments.

[0050] A layout design method according to an embodiment of the present invention is as follows: figure 2 As shown, the specific steps are as follows:

[0051] Step 21, according to the first design rule provided by the process manufacturer, set the second design rule and combine it ...

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Abstract

The invention provides a method and a device for designing territory. The method includes steps as follows: obtaining a distance rule among all figures in the system territory according with a first design rule; converting the distance rule into a second design rule relative with the territory frame; designing each sub-territory in the system territory according with the first design rule and the second design rule; processing rule detection to all sub-territory. The method can process territory splicing design rule detection in a design step of single sub-territory that save process for processing combination splicing detection to territory, increases efficiency for designing territory greatly; at the same time, avoids design rule error caused by territory splicing efficiently, and ensures reliability of the territory thoroughly.

Description

technical field [0001] The invention relates to the field of layout design, in particular to a layout design method and device. Background technique [0002] When designing the layout (Layout), it is necessary to abide by the design rules provided by the process manufacturer. The design rules are set according to the actual process level and yield requirements of the process products under normal working conditions. Collection size limit. [0003] After the layout design is completed, a Design Rules Check (DRC, Design Rules Check) needs to be performed on the layout. When performing design rule checks on a single sub-layout in the system layout, it is only necessary to check the design rules provided by the process manufacturer to ensure that there are no design rule errors in the sub-layout. However, when multiple sub-layouts without design rule errors are spliced ​​together, there is no guarantee whether there are design rule errors in the entire system layout. [0004]...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
Inventor 罗晋马亮郭奕
Owner 修思(北京)电影科技有限公司
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