Pattern describing apparatus and pattern describing method
A technique for depicting devices and patterns, which is applied in photoplate-making process exposure devices, photoplate-making process of patterned surfaces, optics, etc., and can solve the problems of large-scale mask production costs, operation costs, and complicated operations.
Inactive Publication Date: 2009-09-02
DAINIPPON SCREEN MTG CO LTD
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Problems solved by technology
When performing divided exposure on such a large area, the production cost of a large mask required for each pattern and the running cost such as replacement become a problem
[0008] On the other hand, in general, in the exposure method using such a mask, the mask must be replaced every time the type of the pattern to be drawn is changed, so the work involved in the exposure process is complicated.
Method used
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Embodiment Construction
[0048] Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0049]
[0050] figure 1 and figure 2 It is a figure which shows the structure of the pattern drawing apparatus 1 which concerns on embodiment of this invention, figure 1 is the side view, figure 2 is a top view. This pattern drawing device 1 is a device for use on a glass substrate for a color filter on which a photosensitive material (color resist in this embodiment) is formed in a manufacturing process of a color filter of a liquid crystal display device. (hereinafter simply referred to as "substrate") 9, a predetermined pattern is drawn. Such as figure 1 and figure 2 As shown, the pattern drawing apparatus 1 mainly includes a base 11 , a stage 10 for holding a substrate 9 , a drive unit 20 for driving the stage 10 relative to the base 11 , a plurality of exposure heads 30 , and an imaging unit 40 . In addition, about the some exposure head 30, there are ...
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The present invention provides a pattern describing apparatus and a pattern describing method. According to the invention, the exposure scanning time can be reduced even a substrate with multiple describing object regions is the object, and multiple regulated patterns and widths can be easily described on the photosensitive material. When exposure heads (30a-30d) respectively perform exposure scanning on the scanning regions one to four (As1-As4), and unit patter groups (SLG) with widths corresponding to the widths of the describing object regions of the scanning regions are pre-formed on a mask. Therefore, even one scanning region (A) includes a part of a scanning object region (At), no mechanism are needed for regulation as in the prior art; and even one scanning region includes respective part of two neighboring scanning object regions (namely one scanning region includes the whole clearance region), two exposure scannings are not needed in the same scanning region.
Description
technical field [0001] The present invention relates to a technique for drawing regular patterns on a plurality of drawing target regions on a substrate on which a photosensitive material is formed. Background technique [0002] Conventionally, in the manufacturing process of substrates for color filters of liquid crystal display devices, glass substrates for flat panel displays (FPD) such as liquid crystal display devices and plasma display devices, semiconductor substrates, printed circuit boards, etc. A pattern drawing device that draws a regular pattern on the surface of the substrate by irradiating light on the substrate on which a photosensitive material is formed. [0003] As such a pattern drawing device, for example, the pattern drawing device described in Patent Document 1 is known. The pattern drawing apparatus of patent document 1 has an exposure head which irradiates the board|substrate with the light from the light source which passed the opening part of a mas...
Claims
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Login to View More IPC IPC(8): G03F7/20
CPCG03F7/0007G03F7/2002
Inventor 井上正雄小八木康幸
Owner DAINIPPON SCREEN MTG CO LTD