Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device

A solid-state imaging element, radiation-sensitive technology, applied in optical elements, photography, radiation control devices, etc., can solve the problems of residue generation, inability to obtain pixel patterns, insufficient substrate adhesion, etc., and achieve the effect of excellent resolution.

Inactive Publication Date: 2009-12-30
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] On the other hand, in the manufacture of color filters used in solid-state imaging devices, it is necessary to form minute pixel patterns of about 1.0 to 3.0 μm, and it is difficult for conventional colored radiation-sensitive compositions to meet this requirement.
In addition, in this case, since the substrate forming the color filter is not a glass substrate but a silicon substrate or a silicon nitride substrate, the conventional coloring radiation-sensitive composition has problems in that residues or Scum (ground dirt) or pixel patterns with the desired resolution cannot be obtained due to insufficient adhesion to the substrate

Method used

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  • Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device
  • Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device
  • Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0285] Add 3 parts by weight of 2,2'-azobisisobutyronitrile, 200 parts by weight of propylene glycol monomethyl ether acetate into a flask equipped with a cooling tube and a stirrer, then add 10 parts by weight of methacrylic acid, methyl 25 parts by weight of benzyl acrylate, 11 parts by weight of styrene, 19 parts by weight of N-phenylmaleimide, 5 parts by weight of glycerol monomethacrylate, 30 parts by weight of ω-carboxy-polycaprolactone monoacrylate parts, and 5 parts by weight of α-methylstyrene dimer as a molecular weight modifier, nitrogen substitution was performed. Thereafter, the reaction solution was stirred slowly to raise the temperature of the reaction solution to 80° C., and was kept at this temperature for 5 hours to perform polymerization to obtain a solution of a copolymer (C-1). (Mw=10,000, Mn=6,000, solid content concentration 31.2% by weight)

Synthetic example 2

[0287] In the flask equipped with a cooling tube and a stirrer, add 3 parts by weight of 2,2'-azobisisobutyronitrile, 200 parts by weight of propylene glycol monomethyl ether acetate, continue to add 15 parts by weight of methacrylic acid, methyl 35 parts by weight of benzyl acrylate, 11 parts by weight of styrene, 19 parts by weight of N-phenylmaleimide, 10 parts by weight of glycerin monomethacrylate, 10 parts by weight of ω-carboxy-polycaprolactone monoacrylate parts by weight, and 5 parts by weight of α-methylstyrene dimer as a molecular weight regulator, were replaced with nitrogen. Thereafter, the reaction solution was stirred slowly to raise the temperature of the reaction solution to 80° C., and was kept at this temperature for 5 hours to perform polymerization to obtain a solution of a copolymer (C-2). (Mw=10,500, Mn=5,200, solid content concentration 31.2% by weight)

Synthetic example 3

[0289] In the flask equipped with a cooling tube and a stirrer, add 3 parts by weight of 2,2'-azobisisobutyronitrile, 200 parts by weight of propylene glycol monomethyl ether acetate, continue to add 20 parts by weight of methacrylic acid, methyl 10 parts by weight of benzyl methacrylate, 12 parts by weight of styrene, 15 parts by weight of N-phenylmaleimide, 15 parts by weight of 2-hydroxyethyl methacrylate, 2-ethylhexyl methacrylate 28 parts by weight and 5 parts by weight of α-methylstyrene dimer as a molecular weight regulator were replaced with nitrogen. Thereafter, the reaction solution was stirred slowly to raise the temperature of the reaction solution to 80° C., and was kept at this temperature for 5 hours to perform polymerization to obtain a solution of a copolymer (C-3). (Mw=10,200, Mn=5,200, solid content concentration 31.4% by weight)

[0290] Preparation of Pigment Dispersion

[0291] Modulation Example 1

[0292] Pigment Red 254 / C.I. Pigment Red 177 / C.I. P...

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PUM

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Abstract

There is provided a radiation-sensitive composition for forming a color filter used for a solid-state image sensing device excellent in resolution without generating residues and scumming on a silicon substrate or a silicon nitride substrate. The radiation-sensitive composition for forming the color filter for the solid-state image sensing device contains (A) a pigment, (B) a dispersant, (C) an alkali-soluble resin, (D) a polyfunctional monomer, (E) a photopolymerization initiator, and (F) a compound represented by the following formula (1): wherein R 1 to R 8 each denote independently a hydrogen atom, a halogen atom or a monovalent organic group.

Description

technical field [0001] The present invention relates to a radiation-sensitive composition for forming a color filter for a solid-state imaging device, a color filter, and a solid-state imaging device. In more detail, it relates to a radiation-sensitive composition for a color filter useful for producing a color filter used in a transmissive or reflective solid-state imaging device, a color filter formed from the composition, and a device provided with the color filter Solid-state imaging element. Background technique [0002] When using a colored radiation-sensitive composition to manufacture a color filter used in a color liquid crystal display element, the following method is generally known: on a glass substrate, or on a glass substrate on which a light-shielding layer with a desired pattern is formed in advance, to form The film of the coloring radiation-sensitive composition is irradiated with radiation (hereinafter referred to as exposure) through a photomask having a...

Claims

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Application Information

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IPC IPC(8): G03F7/028G02B7/20G03F7/00H01L27/146
CPCC08F2/46G02B5/201G03F7/0007G03F7/0045G03F7/027G03F7/033G03F7/0382G03F7/0397
Inventor成濑真吾宫崎智和成濑秀则吉泽英彻山口紫
OwnerJSR CORPORATIOON