Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device for preparing membrane by liquid level sedimentation method

A technology of sedimentation method and liquid level, which is applied to the device and coating of the surface coating liquid, which can solve the problems of difficult control of film thickness, difficulty of industrial application, difficulty of curing atmosphere, etc., to achieve convenient preparation and controllable thickness , the effect of reducing the amount of liquid

Inactive Publication Date: 2010-01-13
BEIJING INSTITUTE OF PETROCHEMICAL TECHNOLOGY
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] There are many disadvantages in the preparation of thin films by the pulling method, such as the large amount of solution used, the trouble of manual insertion for multiple pulls, the difficulty of controlling the thickness of each film, the difficulty of increasing the curing atmosphere, the difficulty of fixing the substrate, and the difficulty of industrial application. Wait

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device for preparing membrane by liquid level sedimentation method
  • Device for preparing membrane by liquid level sedimentation method
  • Device for preparing membrane by liquid level sedimentation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] Such as figure 2 , 3 As shown, this embodiment provides a device for preparing a thin film by a liquid level sedimentation method, which is used to prepare a thin film on a substrate. The device specifically includes:

[0030] Container 21, heating plate 22, liquid reservoir 24 and pipeline 23, wherein, described container 21 is a square flat structure, is provided with infusion port 211 on the container, and described container 21 passes through infusion port 211 through pipeline 23 and liquid reservoir 24 communicates; the container 21 is provided with a heating plate 22 (controllable heating plate can be used), and the heating plate 22 is corresponding to the position of the substrate 25 for film formation in the container 21, and is used for drying and annealing of the film. Among them, the container 21 with a square flat structure can effectively reduce the amount of liquid used when preparing the thin film. Only a small amount of liquid can be used to soak the s...

Embodiment 2

[0035] Such as Figure 5 As shown, this embodiment provides a device for preparing thin films by liquid level settling method with adjustable inclination angle. Specifically, on the basis of the device described in Embodiment 1, a container inclination adjuster 28 is provided, and the inclination angle of the container is adjusted The device 28 is a fan-shaped flat plate structure, and a plurality of positioning clips 27 and a movable card seat 26 for placing the container are evenly arranged on one side of the container inclination adjuster 28, and the container 21 for placing the substrate is placed on the container inclination adjustment On the movable holder 26 of the device 28, the upper end of the container 21 is clamped on the positioning clamp 27 of the container tilt adjuster 28. When the upper end of the container 21 is clamped on the positioning clamp 27 at different positions, the container 21 is then positioned At different inclination angles, because it communica...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a device for preparing a membrane by the liquid level sedimentation method. The device comprises a container, a heating plate, a liquid storage device and a pipeline, wherein the container adopts a square flat structure and is provided with a liquid inlet; the container is communicated with the liquid storage device through the liquid inlet via the pipeline; and the container is also provided with the heating plate, and the heating plate corresponds to the position of a substrate arranged in the container and used for placing the membrane, and is used for drying and annealing the membrane. The device has simple structure; because the container with the square flat structure is adopted, the liquid consumption is reduced, and the cost of preparing the membrane is effectively lowered; by controlling the sedimentation of the liquid level, the membrane can be conveniently prepared, and the substrate does not need to be moved; and the device can be inclined in any angle, the one-time filming thickness is controllable, and the time for preparing the membrane is shortened.

Description

technical field [0001] The invention relates to a technology for preparing thin films, in particular to a device for preparing thin films by means of a liquid level subsidence method. Background technique [0002] The preparation and research of thin film materials is one of the main subjects of material science research. There are many methods for thin film preparation, such as MOCVD, PECVD, PLD, molecular beam epitaxy, magnetron sputtering, sol-gel method, gel rejection method, Tira method, etc. The thin film preparation method is widely used by thin film researchers due to its simple and cheap equipment. [0003] In the prior art, the pulling method generally adopts such as figure 1 The equipment shown is composed of a barrel-shaped container 2 arranged in a drying box 1, and a motor 3 is arranged on the drying box 1. When preparing a film, the substrate 4 is immersed in the suspension wire 5 driven by the motor 3 into the film. In the drum-shaped container 2 of the fi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B05C3/02B05C3/109B05D1/18
Inventor 武光明王怡朱江唐文张菲菲韩彬江伟
Owner BEIJING INSTITUTE OF PETROCHEMICAL TECHNOLOGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products