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Pattern optimization display method in stamp pattern design system

A pattern design and pattern display technology, applied in computing, instruments, electrical digital data processing, etc., can solve problems such as large memory consumption, delay in movement, slow display speed, etc., to reduce memory usage, speed up display speed, The effect of improving the drawing quality

Inactive Publication Date: 2011-05-04
SHANDONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the editing of printing and dyeing patterns, large bitmap files are used, which consume a lot of memory. The user's computer configuration is generally not high, and the huge memory slows down the display speed and delays movement.

Method used

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  • Pattern optimization display method in stamp pattern design system
  • Pattern optimization display method in stamp pattern design system
  • Pattern optimization display method in stamp pattern design system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0041] Embodiment 1 of the present invention such as Figure 2-5 As shown, a pattern display and optimization method in a printing pattern design system, the steps are as follows:

[0042] 5. Start;

[0043] 6. The system obtains the true-color fabric base map scanned by the scanning device, reduces its color depth and resolution through conversion, and then imports it into the system;

[0044] 7. After the base map data is imported into the system, the user creates a monochrome bitmap with a color depth of 1 bit, and the system prompts the user to input some parameters required for creating a monochrome bitmap, including the edited resolution and monochrome image The color of the foreground color of the layer, and the background color system of the monochrome image is all specified as white;

[0045] 8. The user decides whether to continue adding layers, if yes go to step 7, if not go to the next step;

[0046] 9. The system performs layer fusion according to the imported ...

Embodiment 2

[0069] Embodiment 2 of the present invention such as figure 1 As shown, a device used in the above method includes an image scanner 1, a computer 2, a display 3 and an input device 4, and is characterized in that the computer 2 is connected to the image scanner 1, the input device 4 and the display 3 respectively, and the input The device 4 is a mouse and a keyboard, and the operation process of the above method is completed through the input device 4 .

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Abstract

The invention relates to a pattern optimization display method in stamp pattern design system, belonging to the technical field of application of computer in light textile stamp. The used devices include an image scanner, a computer, a display and an input device; wherein the computer is respectively connected with the image scanner, the input device and the display; the pattern optimization display method in stamp pattern design system provided by the invention supports monochromatic editing and fusion display in stamp patter design. The user can timely browse the effect of the whole patternand improves plotting quality. Besides, by methods of local display, reducing base map resolution and colour depth, internal memory consumption is reduced and display speed of pattern is improved.

Description

technical field [0001] The invention relates to a pattern optimization display method in a printing pattern design system, which belongs to the technical field of computer application in textile printing. Background technique [0002] At present, existing pattern editing systems for the textile printing industry include Huaguang and other systems. Huaguang Electronic Printing Color Separation System is a joint cooperation between Weifang Huaguang Technology Co., Ltd. and Shandong University. It is an open electronic printing color separation system. It is an integrated system integrating sample scanning, pattern design and editing, moiré processing, step-by-step output and other functions. In similar printed pattern editing systems, the following problems exist in the process of pattern editing and displaying. In the editing of printing and dyeing patterns, large bitmap files are used, which consume a lot of memory. The user's computer configuration is generally not high, ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50
Inventor 李学庆祁斌王磊
Owner SHANDONG UNIV