Method and device for washing industrial dust

A technology for cleaning devices and dust, applied in cleaning methods and utensils, cleaning methods using gas flow, chemical instruments and methods, etc., can solve problems such as inability to guarantee cleanliness, waste of resources and space, secondary pollution, etc., and achieve two The possibility of secondary pollution is small, saving resources and space, and the effect of good cleanliness

Inactive Publication Date: 2010-06-02
深圳市聚美通用科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The dust requirements in the production process of liquid crystal substrates, plasma substrates, films and layouts are very strict. The existing industrial dust cleaning methods use water washing or brush cleaning, which wastes resources and space and increases costs. , Second, the cleanliness cannot be guaranteed, and the possibility of secondary pollution is extremely high

Method used

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  • Method and device for washing industrial dust
  • Method and device for washing industrial dust

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Embodiment Construction

[0019] Hereinafter, the present invention will be described in detail with reference to the accompanying drawings and in conjunction with preferred embodiments.

[0020] The industrial dust cleaning method of the present invention uses a vortex formed by a high-pressure gas to sweep the surface of the workpiece, and then uses a vacuum port to suck away the dust purged by the vortex. So as to achieve the purpose of cleaning the surface of the workpiece. The device according to the method of the present invention is described below.

[0021] figure 1 The structure of the device for cleaning industrial dust using gas according to the present invention is schematically shown. As shown in the figure, the industrial dust cleaning device using gas according to the present invention includes a vortex generating device 30, a cover 40, a vacuuming device (not shown in the figure), and a conveying device 10 for conveying workpieces to be cleaned.

[0022] The conveying device 10 is used to c...

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Abstract

The invention discloses a method and a device for washing industrial dust. The method comprises the following steps of: sweeping the surface of a workpiece by utilizing vortex formed by high pressure gas, and pumping dust blown up by the vortex by utilizing a vacuum hole. In addition, the invention also provides a device for washing industrial dust. The device comprises a vortex generating deviceprovided with at least a vortex outlet, a cover arranged at the periphery of the vortex generating device so as to form the vacuum hole surrounding the vortex generating device and a vacuum pumping device connected with the vacuum hole. The method can replace the methods of utilizing water for washing, utilizing a brush for washing, and the like, saves resources and space and reduces cost, the washed cleanliness is good, and the possibility of secondary contamination is little.

Description

Technical field [0001] The invention relates to the field of plasma displays, and in particular to a method and device for cleaning industrial dust. Background technique [0002] The requirements for dust in the production process of liquid crystal substrates, plasma substrates, films and layouts are very strict. The existing industrial dust cleaning methods use water washing or brush cleaning, which wastes resources and space and increases costs. , Second, cleanliness cannot be guaranteed, and the possibility of secondary pollution is great. [0003] Therefore, it is necessary to improve the existing cleaning methods. Summary of the invention [0004] The purpose of the present invention is to provide a method and device for cleaning industrial dust using gas to replace water washing or brush cleaning. [0005] For this reason, the method for cleaning industrial dust with gas provided by the present invention includes: using a vortex formed by a high-pressure gas to sweep the surfa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B5/02B08B15/00B08B5/04
Inventor 柴立军吕娜
Owner 深圳市聚美通用科技有限公司
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