Proximity exposure apparatus, method of delivering a mask of a proximity exposure apparatus and method of manufacturing a display panel substrate
An exposure device and a proximity-type technology, which are applied to the exposure device of the photoengraving process, the photoengraving process of the pattern surface, the microlithography exposure equipment, etc., can solve the position shift, the general products and methods do not have suitable structures and methods. , inconvenience, etc.
Inactive Publication Date: 2010-06-16
HITACHI HIGH-TECH CORP
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Problems solved by technology
However, when the positioning of the mask is performed before the mask is installed, if the conventional positioning pins are used to prevent the deviation of the mask, there is a problem that when the positioning pins hit the side surface of the mask The position of the positioned mask is shifted when
[0008] It can be seen that the above-mentioned existing proximity exposure device, its mask transfer method and panel substrate manufacturing method obviously still have inconveniences and defects in product structure, method and use, and need to be further improved urgently.
In order to solve the above-mentioned problems, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and there is no suitable structure and method for general products and methods to solve the above-mentioned problems. This is obviously a problem that relevant industry players are eager to solve
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[0083] In order to further explain the technical means and effects adopted by the present invention to achieve the predetermined invention purpose, the following is combined with the accompanying drawings and preferred embodiments to describe the proximity exposure device, its mask transfer method and the manufacture of the panel substrate according to the present invention. The specific implementation, structure, method, steps, features and effects of the method are described in detail below.
[0084] The aforementioned and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of preferred embodiments with reference to the drawings. Through the description of the specific implementation mode, a more in-depth and specific understanding of the technical means and effects adopted by the present invention to achieve the intended purpose can be obtained. However, the accompanying drawings are only for...
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A proximity exposure apparatus of the invention can position a mask smaller than a substrate with excellent precision for installing the mask on a mask holder. A plurality of ejector pin units which are provided with ejector pins 12 that lift from the inner part of a chuck 10 and a motor 11 for vertically moving the ejector pins 12 are equipped on the chuck 10. The mask 2 is conveyed into the chuck 10 through a mask conveying device. Furthermore the mask 2 is received from the mask conveying device through the ejector pins 12. A first image obtaining device 52 is moved through a moving mechanism 53. Furthermore a marked image for detecting the position of the mask 2 is obtained through the first image obtaining device 52. The image signal of the first image obtaining device 52 is processed for detecting the position of the mask 2. Additionally, according to the detected position of the mask 2, the chuck 10 is moved through an X platform 5, a Y platform 7 and a theta platform 8 for positioning the mask 2. The mask 2 is equipped to the mask holder 20 through the ejector pins 12.
Description
technical field [0001] The present invention relates to a proximity exposure device for exposing a substrate using a proximity method in the manufacture of a display panel substrate such as a liquid crystal display device, a mask transfer method for the proximity exposure device, and a method using the proximity exposure device. Apparatus and method for manufacturing a display panel substrate, particularly a proximity exposure apparatus suitable for positioning a large mask and mounted on a mask holder, a mask transfer method for the proximity exposure apparatus, and A method of manufacturing a display panel substrate using the apparatus and method. Background technique [0002] Thin Film Transistor (TFT) substrates for liquid crystal display devices used as display panels, color filter (color filter) substrates, plasma (plasma) display panel substrates, and organic electroluminescence (ElectroLuminescence, EL) display Manufacture of the board|substrate for panels etc. is p...
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Login to View More IPC IPC(8): G03F7/20H01L21/68
CPCG03F7/70216G03F7/707G03F7/70733G03F7/70775H01L21/67259
Inventor 森顺一松山胜章樋川博志
Owner HITACHI HIGH-TECH CORP