MEMS (micro electro mechanical system) element with function of dust prevention and manufacturing method thereof
A technology for micro-electromechanical components and manufacturing methods, which is applied in the manufacturing of electrical components, electrical solid-state devices, semiconductor/solid-state devices, etc., and can solve problems such as affecting the operation of mechanical structures.
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[0024] The drawings in the present invention are all schematic, mainly intended to represent the manufacturing process steps and the upper and lower sequence relationship between each layer, as for the shape, thickness and width, they are not drawn to scale.
[0025] First, a first embodiment of the present invention will be described. see Figure 1A In this embodiment, firstly, a zeroth layer wafer substrate 11 is provided, and the substrate 11 can be, for example, a silicon substrate to be compatible with the CMOS process. Next, on the substrate 11, transistor elements (not shown) are produced by a CMOS process, and then interconnects are produced by deposition, lithography, etching and other processes in sequence, such as Figure 1A The contact layer 12a, each metal layer 13, each channel layer 12b, etc. Wherein, the contact layer and the channel layer can be made of tungsten, the metal layer can be made of aluminum, and the dielectric material can be made of oxide such a...
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