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Anti-reflection plate and manufacturing method for anti-reflection structure thereof

A manufacturing method and anti-reflection technology, applied in gaseous chemical plating, coatings, instruments, etc., can solve the problems of time-consuming process, difficult control of multi-layer film yield, high cost, etc.

Inactive Publication Date: 2010-06-30
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since most of the existing thin film processes need to be coated in a vacuum environment, the required process is very time-consuming and expensive
In addition, the yield rate of multi-layer films is difficult to control, making the cost of products using anti-reflection technology very high and cannot be popularized by the public

Method used

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  • Anti-reflection plate and manufacturing method for anti-reflection structure thereof
  • Anti-reflection plate and manufacturing method for anti-reflection structure thereof
  • Anti-reflection plate and manufacturing method for anti-reflection structure thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0049] Please refer to figure 1 , which is a flow chart showing the steps of forming the anti-reflective plate according to Embodiment 1 of the present invention. and please also refer to Figure 2A , which shows a schematic diagram of the object to be treated and the atmospheric plasma equipment. Firstly, as shown in step 11 , an object to be treated 100 is provided in the reaction zone 6 , and the object to be treated 100 is placed on the platform 5 with the exposed surface 101 under the plasma gun 2 . In this embodiment, the object 100 to be processed is, for example, a substrate. The material of the object 100 to be processed may be glass or polymethyl methacrylate (PMMA), used as a protective cover or window glass for a display, or a silicon wafer used to manufacture a solar panel.

[0050] Next, as shown in step 12 , plasma is provided to originate in the reaction zone 6 . The plasma source can be at least one of inert gas, air, nitrogen, oxygen, fluorocarbon gas and...

Embodiment 2

[0060] The difference between the second embodiment and the anti-reflection sheet of the first embodiment lies in that the anti-reflection sheet of the second embodiment forms a micro-protrusion structure by plasma coating under normal pressure. Please refer to Figure 4 , which is a flow chart showing the steps of forming the anti-reflection plate according to the second embodiment of the present invention. and please also refer to Figure 5A , which shows a schematic diagram of the substrate to be coated and the atmospheric plasma equipment.

[0061] First, as shown in step 21 , the object to be coated 200 is provided in the reaction zone 6 , and the exposed surface 201 of the object to be coated 200 is placed on the platform 5 and located under the plasma gun 2 . In this embodiment, the object to be coated 200 is, for example, a substrate. The material of the object to be coated 200 is, for example, PMMA, silicon wafer, polycarbonate (Polycarbonate, PC) or glass.

[006...

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Abstract

The invention relates to an anti-reflection plate and a manufacturing method for an anti-reflection structure thereof. The method comprises the following steps of firstly, providing the material to be treated in a reaction zone; secondly, providing a plasma source in the reaction zone; thirdly, dissociating the plasma source under the normal pressure to form plasma; and finally, performing surface treatment to the material to be treated through the plasma to from a plurality of microbump structures on the surface of the material to be treated; and the anti-reflection plate comprises a plurality of microbump structures arranged on the light incident plane, wherein the average width of any microbump structure in the microbump structures is ranged from 10 nm to 500 nm.

Description

technical field [0001] The invention relates to an anti-reflection plate and a method for manufacturing the anti-reflection structure thereof, in particular to an anti-reflection plate with an anti-reflection structure of nanoscale micro-protrusions and a method for manufacturing the anti-reflection plate. Background technique [0002] Anti-reflection technology can be widely used in various fields, such as the surface of spectacle mirror wafers and optical discs, or the display surfaces of TVs, computer screens, digital cameras, PDAs, GPS and mobile phones, as well as the surfaces of automotive glass, aircraft and automobile dashboards , even display windows and biomedical applications. After the object is treated with anti-reflection technology, it can reduce the glare or ghosting phenomenon caused by the reflection of the external light source on the surface of the object, and even use it on the surface of the solar panel to increase the utilization efficiency of light en...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11C23C16/00G02B1/118
Inventor 陈志玮吴清吉谢文宗许文通林春宏
Owner IND TECH RES INST