Single-layer cloth plain cloth device of computer quilting embroidery machine

An embroidery machine and quilting technology, which is applied in the field of single-layer cloth and plain cloth devices, can solve the problems of insufficient flatness, high softness, and large deformation of the cloth edge, and achieve high innovation and practicability, and the overall structure Simple, scientific and reasonable design effect

Inactive Publication Date: 2010-08-18
上工富怡智能制造(天津)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Computerized quilting and embroidery machines used in the quilting and embroidery industry, when stretching flexible objects (mainly referring to fabrics) in the Y direction, the X direction generally cannot be fully flattened, resulting in poor flatness of the fabric in the X direction; especially For single-layer fabrics, the softness is relatively high. Under the pull of the Y-direction cloth axis, the X-direction cloth edge deformation is relatively large, which has a serious impact on the embroidery quality of the embroidery machine.
[0003] Through understanding, no related devices have been found

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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  • Single-layer cloth plain cloth device of computer quilting embroidery machine
  • Single-layer cloth plain cloth device of computer quilting embroidery machine
  • Single-layer cloth plain cloth device of computer quilting embroidery machine

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Embodiment Construction

[0015] The present invention will be further described in detail below in conjunction with the accompanying drawings and through specific embodiments. The following embodiments are only descriptive, not restrictive, and cannot limit the protection scope of the present invention.

[0016] A single-layer flat cloth device for a computerized quilting embroidery machine, which is composed of a saddle frame connecting rod 3, a cloth support 2, a barbed shaft 1, a bracket plate 5 and a clamping part 4, and the lower end of the clamping part is designed in a groove shape structure, the groove shape can fit the saddle frame connecting rod and be fixed with it. On the vertical plate of the clamping part, a support plate perpendicular to the side of the clamping part is fixed by a screw (no label), the front upper part of the support plate is vertically equipped with a thorn shaft, and a support plate 6 is installed on the rear upper part of the support plate. The support plate is insta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Abstract

The invention relates to a single-layer cloth plain cloth device of a computer quilting embroidery machine. The single-layer cloth plain cloth device consists of a saddle frame connecting rod, a cloth-supporting bracket, a spinous shaft, a support plate and a clamping element, wherein the lower end of the clamping element is fixedly installed with the saddle frame connecting rod, the support plate vertical to a side surface of the clamping element is fixedly installed on a vertical plate of the clamping element, the spinous shaft is vertically installed at the upper part in the front of the supporting plate, and the V-shaped cloth-supporting bracket is fixedly installed below the spinous shaft and is coaxial with the spinous shaft. The invention has simple integral structure and scientific and reasonable design, enables flexible objects (cloths) to realize stretching and flattening functions in the X direction under the repeated actions in the Y direction, ensures the flattening of the flexible objects (cloths), realizes the exquisite quality of an embroidery and has better creativity and practicability.

Description

technical field [0001] The invention relates to a computerized quilting embroidery machine, in particular to a single-layer flat cloth device of the computerized quilting embroidery machine. Background technique [0002] Computerized quilting and embroidery machines used in the quilting and embroidery industry, when stretching flexible objects (mainly referring to fabrics) in the Y direction, the X direction generally cannot be fully flattened, resulting in poor flatness of the fabric in the X direction; especially For single-layer fabrics, the softness is relatively large, and under the pull of the cloth axis in the Y direction, the edge of the cloth in the X direction is greatly deformed, which has a serious impact on the embroidery quality of the embroidery machine. [0003] Through understanding, no related devices have been found. Contents of the invention [0004] The object of the present invention is to provide a single-layer cloth flat cloth device of a computeri...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D05C9/04D05B35/00
Inventor 王彬
Owner 上工富怡智能制造(天津)有限公司
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