Photosensitive monomer, liquid crystal panel and manufacturing method thereof
A technology of photosensitive monomers and groups, which can be applied in the photoengraving process, optics, optomechanical equipment and other directions of the pattern surface, and can solve the problems of image retention and so on.
Inactive Publication Date: 2010-09-01
AU OPTRONICS CORP
View PDF0 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, although the photoinitiator can speed up the manufacturing time, the manufactured LCD panel will have the problem of image sticking (image sticking)
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM

Abstract
The invention discloses a photosensitive monomer which is a compound III, wherein m is no less than 1, L is hydrogen atom, fluorine atom, chlorine atom, cyano, alkyl, alkylcarbonyl, carbalkoxy or alkylcarbonyloxy with 1-7 carbon atoms; R is hydrogen atom, fluorine atom, chlorine atom, cyano, thiocyano, sulfur pentafluoride group, nitrite radical, linear or branched alkyl with 1-12 carbon atoms or Z2-Sp2-P2 group; Z1 and Z2 are respectively oxygen atom, sulfur atom, methoxy, carbonyl, carboxyl, carbamoyl, methylthio, ethylene carbonyl, carbonyl vinyl or single bond; and Sp1 and Sp2 are linear or branched alkyl with 1-8 carbon atoms or single bond.
Description
This application is a divisional application of Chinese patent application 200710006219.2 (application date: February 7, 2007, invention name: photosensitive monomer, liquid crystal panel and its manufacturing method). technical field The invention relates to a photosensitive monomer, and in particular to a photosensitive monomer applied to a liquid crystal panel and a manufacturing method thereof. Background technique In recent years, liquid crystal panels have developed an alignment technology: Polymer-Stabilizing Alignment (PSA) technology, which is to mix photosensitive monomers into the liquid crystal layer, and then irradiate ultraviolet light after they are arranged to make the photosensitive The monomers are polymerized into alignment polymers to guide the arrangement of liquid crystal molecules. In order to shorten the polymerization time, a photosensitive monomer and a photoinitiator (initiator) are mixed in the liquid crystal layer at the same time to help the ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline

IPC IPC(8): G03F7/027G02F1/1337G02F1/1333C07C69/653C07C69/618C07C233/20C07D207/452
Inventor 谢忠憬
Owner AU OPTRONICS CORP
Features
- Generate Ideas
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
Why Patsnap Eureka
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com