Photosensitive monomer and liquid crystal panel, and manufacture method therefor
A technology of photosensitive monomers and substrates, which is applied in the photoplate-making process, optics, and optomechanical equipment on the patterned surface, and can solve problems such as image retention
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[0033] The present invention mainly proposes a photosensitive monomer, which can shorten the polymerization time and improve the problem of image sticking when applied to the manufacturing method of the liquid crystal panel. The general chemical formula, preferred embodiments and synthesis methods of the photosensitive monomers will be introduced first, and then the method of applying these photosensitive monomers to the fabrication of optoelectronic devices and liquid crystal panels will be introduced.
[0034] photosensitive monomer
[0035] The present invention mainly proposes a photosensitive monomer selected from one of compounds I, II, and III.
[0036] Compound I is represented by the chemical formula:
[0037]
[0038] "L" is a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, an alkyl group, an alkylcarbonyl group, an alkoxycarbonyl group or an alkoxycarbonyl group having 1 to 7 carbon atoms base (alkylcarbonyloxy). One or more hydrogen atoms in...
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