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Photosensitive monomer and liquid crystal panel, and manufacture method therefor

A technology of photosensitive monomers and substrates, which is applied in the photoplate-making process, optics, and optomechanical equipment on the patterned surface, and can solve problems such as image retention

Inactive Publication Date: 2010-04-14
AU OPTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although the photoinitiator can speed up the manufacturing time, the manufactured LCD panel will have the problem of image sticking (image sticking)

Method used

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  • Photosensitive monomer and liquid crystal panel, and manufacture method therefor
  • Photosensitive monomer and liquid crystal panel, and manufacture method therefor
  • Photosensitive monomer and liquid crystal panel, and manufacture method therefor

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Embodiment Construction

[0033] The present invention mainly proposes a photosensitive monomer, which can shorten the polymerization time and improve the problem of image sticking when applied to the manufacturing method of the liquid crystal panel. The general chemical formula, preferred embodiments and synthesis methods of the photosensitive monomers will be introduced first, and then the method of applying these photosensitive monomers to the fabrication of optoelectronic devices and liquid crystal panels will be introduced.

[0034] photosensitive monomer

[0035] The present invention mainly proposes a photosensitive monomer selected from one of compounds I, II, and III.

[0036] Compound I is represented by the chemical formula:

[0037]

[0038] "L" is a hydrogen atom, a fluorine atom, a chlorine atom, a cyano group, an alkyl group, an alkylcarbonyl group, an alkoxycarbonyl group or an alkoxycarbonyl group having 1 to 7 carbon atoms base (alkylcarbonyloxy). One or more hydrogen atoms in...

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PUM

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Abstract

This invention relates to light sensitive monomer, which comprises three compounds with following formula: L for hydrogen atom, cyano, fluorine and chlorine atom, alkyl, alkoxycarbonyl or with one toseven carbon atoms; R for hydrogen atom, fluorine and chlorine atom, cyano, sulfur pentafluoride, nitrite anions with one to twelve carbon atom direct linkage or branch alkyl chain and Z2-Sp2-P2 group;Z1 and Z2 from oxygen atom, sulfur atom, methoxy, carbonyl, carboxy group, formamido, methylmercapto group, ethoxycarbonyl group, ethoxycarbonyl group and single key.

Description

technical field [0001] The invention relates to a photosensitive monomer, and in particular to a photosensitive monomer applied to a liquid crystal panel and a manufacturing method thereof. Background technique [0002] In recent years, liquid crystal panels have developed an alignment technology: Polymer-Stabilizing Alignment (PSA) technology, which is to mix photosensitive monomers into the liquid crystal layer, and then irradiate ultraviolet light after they are arranged to make the photosensitive The monomers are polymerized into alignment polymers to guide the arrangement of liquid crystal molecules. [0003] In order to shorten the polymerization time, a photosensitive monomer and a photoinitiator (initiator) are mixed in the liquid crystal layer at the same time to help the photosensitive monomer to quickly polymerize. However, although the photoinitiator can speed up the manufacturing time, the manufactured liquid crystal panel will have the problem of image stickin...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027G02F1/1337G02F1/1333
Inventor 谢忠憬
Owner AU OPTRONICS CORP
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