Micromechanical rate-of-rotation sensor

Abstract

The present invention relates to a micromechanical Coriolis rate-of-rotation sensor for detecting a rate of rotation about a measurement axis which is denoted the X axis below, having a substrate, an oscillation structure and means for generating a rotational oscillation about an excitation axis (Z axis) which is orthogonal to the measurement axis, wherein the oscillation structure is rotatably connected to the substrate by means of first, inner suspension means or by means of a central suspension means, with the result that it can carry out rotational oscillations about a fulcrum relative to the substrate, wherein at least one pair of second suspension means also connects the oscillation structure to the substrate and is arranged on opposite sides of the fulcrum, wherein the at least one pair of second suspension means is arranged at a greater radial distance from the fulcrum than the first, inner suspension means or the central suspension means in order to provide a micromechanical Coriolis rate-of-rotation sensor with a response behaviour which can be designed in a manner specific to the axis of rotation and with sufficient sensitivity to rates of rotation in one or more directions of rotation, which sensor simultaneously has sufficient robustness with respect to the effect of external shock or vibration in the measuring direction or directions (about a detection axis) in order to meet the requirements for electronic signal processing as far as possible and, in particular, to counteract the risk of the oscillation structure sticking on the substrate.

Description

technical field [0001] The invention relates to a micromechanical Coriolis rotational rate sensor for detecting the rotational rate about a measuring axis, referred to below as the X-axis. The micromechanical Coriolis rotational rate sensor has a substrate, a vibrating structure and means for generating rotational vibrations about an excitation axis (Z-axis) orthogonal to the measuring axis. The oscillating structure is rotatably connected to the substrate by means of an inner first suspension or by means of a central suspension, so that the oscillating structure can oscillate rotationally about a point of rotation relative to the substrate. Background technique [0002] Micromechanical rotational rate sensors are already known from the prior art, wherein a distinction can generally be made between decoupled sensors and coupled sensors. In the case of decoupled sensors, the vibrating structure has a drive element and a detection element which is mechanically separated from ...

AI Technical Summary

Problems solved by technology

[0007] Although in this way the rate of rotation can be detected as a function of the direction of the rate of rotation, the sensors known from the prior art are susceptible to disturbances due to their central suspension to the influence of external disturbance variables such as shock acceleration or vibrations, usually not robust

Strong relative positional changes between detection unit and substrate can thus occur, which in turn can lead to so-called sticking and unusable sensors

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