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Wafer defect marking system

A technology for chip defects and wafers, which is applied in the direction of optical testing defects/defects, electrical components, semiconductor/solid-state device manufacturing, etc. It can solve problems such as difficulty in finding corresponding position marks, increased error rate, time-consuming and labor-consuming operations, etc.

Active Publication Date: 2010-10-27
CHIPMOS TECH INC
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Problems solved by technology

After marking the abnormal chips of a wafer on the paper wafer map, it is necessary to delete them one by one according to the position of the abnormal chips on the paper wafer map. However, when the number of abnormal chips on the paper wafer map increases more, it will take longer for the operator to remove abnormal chips
[0003] Therefore, based on the above, when the operator visually marks the abnormal chip on the paper wafer map, it is prone to artificially unclear or wrong marking, resulting in the generation of bad wafer map.
Moreover, as the size of chips is becoming thinner and smaller today, it is even more difficult for operators to find the corresponding position on the paper wafer map for marking, which will result in time-consuming and labor-consuming operations and increase the error rate
Finally, after the paper wafer map is completed, it needs to be manually counted in the counting system again, and this step needs to spend time and cost again

Method used

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Embodiment Construction

[0011] Since the present invention discloses a wafer defect marking system for wafer surface inspection, the basic principles and functions of wafer chip testing principles, image conversion and data transmission have been understood by those with ordinary knowledge in the relevant technical field, so the following The instructions in the text are no longer described in full. At the same time, the drawings compared below are schematic structural representations related to the features of the present invention, and are not and need not be completely drawn according to the actual size, so please describe first.

[0012] First please refer to figure 1 , the preferred embodiment of the present invention is shown in the figure, which is a wafer defect marking system 100, which is used to mark chips with defects on the wafer 200. This wafer defect marking system 100 includes a carrying platform 1, a microscopic observation module 2. The reading module 3 , the first computing module...

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Abstract

The invention provides a wafer defect marking system, which comprises a bearing platform, a micro observation module, a reading module, a first operation module, a second operation module, an image display module, an image conversion module, an alignment module and a chip defect marking module. The wafer defect marking system can be provided for an operator to directly perform marking work of a defected chip on the image display module.

Description

technical field [0001] The invention relates to a wafer defect marking system, in particular to a wafer defect marking system applied in semiconductor wafer detection. Background technique [0002] In the semiconductor wafer manufacturing process, in addition to using electrical tests to test the good and bad of the die on the wafer before the wafer is cut, it is also necessary to ask the operator to visually inspect the appearance of the die on the wafer. To ensure that the surface of the chip is free from scratches, dirt... and other defects. Usually, the operator visually inspects the chips on the wafer with a microscope, and after observing the abnormal chip with defects, finds out the corresponding position of the abnormal chip on a paper wafer map and marks it according to the position of the abnormal chip. After marking the abnormal chips of a wafer on the paper wafer map, it is necessary to delete them one by one according to the position of the abnormal chips on th...

Claims

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Application Information

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IPC IPC(8): H01L21/00H01L21/66G01N21/88
Inventor 范光俊
Owner CHIPMOS TECH INC
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