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Cyanide-free alkaline copper plating solution and preparation method thereof

A technology of cyanide-free alkaline copper plating and copper plating solution, which is applied in the field of preparation of cyanide-free alkaline copper plating solution and cyanide-free alkaline copper plating solution, and can solve the problem of poor bonding force of the plating layer, affecting the bonding force of the plating layer, and deposition Speed ​​drop and other problems, to achieve the effect of good dispersion ability of plating solution, strong throwing and covering power, strong throwing ability and covering ability

Inactive Publication Date: 2011-10-26
武汉风帆电化科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The two phosphorus of pyrophosphate are connected by oxygen. When the pH value is low, the pyrophosphate is easily hydrolyzed to produce orthophosphate and accumulate in the plating solution, so that the deposition rate is significantly reduced. And because many metals are in In the pyrophosphate plating solution, there will be a displacement reaction to produce a replacement copper layer, which will affect the bonding force between the plating layers, so pre-plating must be carried out before plating.
The cost of such a plating solution is high, the operating conditions are harsh, the plating solution is unstable, and waste solution treatment is difficult, etc., especially the poor bonding force of the plating layer hinders the popularization and application

Method used

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  • Cyanide-free alkaline copper plating solution and preparation method thereof
  • Cyanide-free alkaline copper plating solution and preparation method thereof
  • Cyanide-free alkaline copper plating solution and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] Plating solution composition:

[0044] 10-(2,5-dihydroxyphenyl)-10-hydro-9-oxa-10-phosphaphenanthrene-10-oxide

[0045] 200g / L

[0046] Copper ion in basic copper carbonate 8g / L

[0047] Potassium hydroxide 20g / L

[0048] Potassium carbonate 30g / L

[0049] Preparation:

[0050] ①. Use distilled water to make basic copper carbonate into a paste; ②. Dissolve the complexing agent with distilled water, and then add potassium hydroxide or sodium hydroxide solution to adjust the pH to 8.0-9.0; ③. Under stirring conditions Next, slowly add solution ① to solution ② to make it fully complexed; ④, dissolve potassium carbonate with distilled water, and gradually add it to solution ③; ⑤, use potassium hydroxide or sodium hydroxide to dissolve the plating solution Adjust the pH value to between 9-10; ⑥, use distilled water to make up the volume before use.

[0051] The cathode current density of the electroplating bath is 0.5A / dm during electroplating 2 , the pH value of the ...

Embodiment 2

[0053] Plating solution composition:

[0054] 10-(2,5-dihydroxyphenyl)-10-hydro-9-oxa-10-phosphaphenanthrene-10-oxide

[0055] 250g / L

[0056] Copper ion in basic copper carbonate 10g / L

[0057] Potassium hydroxide 30g / L

[0058] Potassium carbonate 35g / L

[0059] Preparation:

[0060] ①Use distilled water to make basic copper carbonate into a paste; ②Dissolve the complexing agent in distilled water, then add potassium hydroxide or sodium hydroxide solution, and adjust the pH to 8.0-9.0; ③Under stirring conditions, mix Add solution ① slowly to solution ② to make it fully complexed; ④ dissolve potassium carbonate with distilled water and add it to solution ③; ⑤ adjust the pH value of the plating solution to 9 with potassium hydroxide or sodium hydroxide again Between -10; ⑥It can be used after making up to volume with distilled water.

[0061] Electroplating copper bath cathode current density 1.0A / dm 2 , the pH value of the plating solution is 9.5, and the temperature o...

Embodiment 3

[0063] Plating solution composition:

[0064] 10-(2,5-dihydroxyphenyl)-10-hydro-9-oxa-10-phosphaphenanthrene-10-oxide

[0065] 300g / L

[0066] Copper ions in copper nitrate 12g / L

[0067] Potassium hydroxide 30g / L

[0068] Potassium carbonate 40g / L

[0069] Preparation method:

[0070] ①Use distilled water to make basic copper carbonate into a paste; ②Use distilled water to dissolve 10-(2,5-dihydroxyphenyl)-10-hydrogen-9-oxa-10-phosphaphenanthrene-10-oxide , then add potassium hydroxide or sodium hydroxide solution, and adjust the pH to between 8.0-9.0; ③ under stirring conditions, slowly add solution ① to solution ② to make it fully complexed; ④ use potassium carbonate Dissolve in distilled water and add to the solution ③ successively; ⑤ Adjust the pH value of the plating solution to 9-10 with potassium hydroxide or sodium hydroxide again;

[0071] Electroplating copper bath cathode current density 1.5A / dm 2 , the pH value of the plating solution is 10.0, and the tempe...

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Abstract

The invention discloses cyanide-free alkaline copper plating solution, which consists of metal copper ions, a complexing agent and conducting salt. The complexing agent is 10-(2,5-dihydroxyphenyl)-10-hydro-9-oxa-10-phosphaphenanthrene-10-oxide, and the content of the complexing agent is 200-300g / L; the conducting salt comprises potassium hydroxide and potassium carbonate, and the content of the conducting salt is 50-75g / L; the content of the metal copper ions is 8-12g / L; and during electroplating, the cathode-current density of a copper plating bath is 0.5-1.5A / dm<2>, the pH value of the plating solution is 9-10, and the temperature of the plating solution is 40-60 DEG C. The cyanide-free alkaline copper plating solution has the advantages of wide application temperature range, high current efficiency, fine plating layer crystals, good appearance and color, stable plating solution, strong levelling power and covering power, low cost and easy wastewater treatment, can replace hypertoxic cyanide copper plating solution, and is used for pre-plating copper or directly plating copper. The invention also relates to a method for preparing the cyanide-free alkaline copper plating solution.

Description

technical field [0001] The invention relates to the technical field of electroplating, in particular to a cyanide-free alkaline copper plating solution that can completely replace cyanide electroplating copper. The invention also relates to a preparation method of the cyanide-free alkaline copper plating solution. Background technique [0002] Electroplating plays an indispensable role in my country's national economy. Many industrial products require electroplating processing, and traditional decorative electroplating solutions must use highly toxic sodium cyanide, which has a huge impact on the environment and social stability. harm. [0003] Since the country promulgated the "Clean Production Promotion Law" and the State Council promulgated Order No. 32, electroplaters have done a lot of research on "eliminating outdated production processes of cyanide-containing electroplating". In recent years, the domestic cyanide-free alkaline copper plating process has been greatly ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D3/38
Inventor 王池刘海凤王志军张红利袁震芹张迎
Owner 武汉风帆电化科技股份有限公司
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