Production method of electrode of dielectric barrier discharge plasma generator

A technology of dielectric barrier discharge and plasma, which is applied in the field of plasma, can solve the problems of deformation of polymer materials, burning of thin film electrodes, and impossibility of implementation, and achieve the effects of improving bonding strength, prolonging service life, and preventing shedding

Active Publication Date: 2011-01-05
BEIJING AERONAUTICAL MFG TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In this paper, Li Gang et al. deposited Cu+SrTiO on quartz glass by evaporation deposition method. 3 thin film, but due to the high temperature in the preparation process, the thin film electrode was burned
For some ...

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] Embodiment 1: (copper electrode strips are deposited on polytetrafluoroethylene with a thickness of 2mm, the electrode strip spacing is 10mm, the width is 2mm, and the electrode strip thickness is 4 μm)

[0021] 1. Clean the PTFE board:

[0022] Put the PTFE board into the water, clean it with ultrasonic waves for 80-120 minutes, then blow it dry with a hair dryer to remove the oil and dust on the surface, then wipe the insulating medium material with gauze dipped in acetone and dry it;

[0023] 2. Paste the masking tape: Process the masking tape into strip grooves with a spacing of 10mm and a width of 2mm, paste the masking tape on the surface of the cleaned PTFE material, and then place the masked PTFE material into a vacuum chamber;

[0024] 3. Install the sputtering target of ion implantation and deposition equipment: install the sputtering target made of high-purity Cu into the ion implantation assisted deposition equipment;

[0025] 4. Install the PTFE material:...

Embodiment 2

[0028] Embodiment 2: (Al electrode strips are deposited on polytetrafluoroethylene with a thickness of 2 mm, the electrode strip spacing is 14 mm, the width is 3 mm, and the electrode strip thickness is 8 μm)

[0029] 1. Clean the PTFE board:

[0030] Put the PTFE board in water, clean it with ultrasonic waves for 80-120 minutes, then blow it dry with a hair dryer to remove surface oil and dust, then wipe the PTFE board with gauze dipped in acetone and dry it;

[0031] 2. Paste the masking tape: Process the masking tape into strip grooves with a spacing of 14mm and a width of 3mm, paste the masking tape on the surface of the cleaned PTFE board, and then place the masked PTFE material into a vacuum chamber;

[0032] 3. Install sputtering targets for ion implantation and deposition equipment: install sputtering targets made of high-purity Al into ion implantation-assisted deposition equipment;

[0033] 4. Install the PTFE plate: put the PTFE plate with the mask on the stage of...

Embodiment 3

[0036] Embodiment 3: (copper electrode strips are deposited on polyimide with a thickness of 1mm, the electrode strip spacing is 10mm, the width is 1mm, and the electrode strip thickness is 6 μm)

[0037] 1. Cleaning polyimide insulation material:

[0038] Put the polyimide insulating material into water, clean it with ultrasonic waves for 80-120 minutes, then blow it dry with a hair dryer to remove surface oil and dust, then wipe the polyimide insulating material with gauze dipped in acetone and dry it;

[0039] 2. Paste the masking tape: Process the masking tape into strip grooves with a spacing of 10mm and a width of 1mm, paste the masking tape on the surface of the cleaned polyimide insulating material, and then place the masked polyimide The imine insulating material is put into the vacuum chamber;

[0040] 3. Install sputtering targets for ion implantation and deposition equipment: install sputtering targets made of high-purity Al into ion implantation-assisted depositi...

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Abstract

The invention belongs to the field of plasma technology and relates to the improvement of the production method of the electrode of a dielectric barrier discharge plasma generator. The production method is characterized in that a metal electrode is deposited on an insulating dielectric material by ion implantation and deposition equipment, and the production method comprises the following steps of: cleaning the insulating dielectric material; adhering a mask adhesive tape; installing the sputtering target of the ion implantation and deposition equipment; installing an accelerating grid; and carrying out the ion implantation of a film for aiding the deposition of a metal electrode bar. The invention can overcome the defect that the electrode bar which is adhered manually is thicker and has large heating quantity, can improve the discharge effect of the generator, greatly increases the bond strength of the electrode bar with a matrix material, prevents the electrode bar from falling off, and prolongs the service life of the generator.

Description

technical field [0001] The invention belongs to the field of plasma technology and relates to the improvement of an electrode manufacturing method of a dielectric barrier discharge plasma generator. Background technique [0002] The dielectric barrier discharge plasma generator can generate a thin layer of plasma on the surface of the insulating medium. The plasma can generate static electricity through the body, which can absorb and improve the airflow around the generator, so it can be used on the aircraft to control the boundary flow layer. Reduce flight resistance, increase lift-to-drag ratio, reduce aircraft noise, and can play a certain stealth function, and can also be used in industrial fields such as ozone generation and sterilization. The plasma generator is mainly composed of upper and lower metal electrode strips and an insulating medium. At present, the plasma generator manufacturing method suitable for different dielectric materials mainly adopts the method of ...

Claims

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Application Information

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IPC IPC(8): C23C14/04C23C14/34H05H1/24
Inventor 马国佳马贺孙刚王剑锋武洪臣
Owner BEIJING AERONAUTICAL MFG TECH RES INST
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