MOS (Metal Oxide Semiconductor) grid base electrode switching tetrode
A tetrode and base technology, applied in the direction of electrical components, electric solid devices, circuits, etc.
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[0063] figure 2 Shown is an embodiment of a single-channel MOS gate-base switching quadrupole transistor of an enhanced p-channel MOS gate-base switching quadrupole transistor (E-pBSTT) with a planar gate structure, which uses a p-channel MOS gate switch A quadrupole transistor with base current of NPN tube. image 3 Shows its equivalent circuit and switch configuration. Its specific implementation is as follows. in n + n - Epitaxial layer 3 in the drift region. After the thick field oxidation is completed, the floating field limiting ring of the high voltage terminal ( figure 2 (not shown) high-concentration p+ doping in the independent prosthetic base region 8 while completing the high-concentration p+ doping. After the photolithography of the active area is completed, gate oxidation and doped polysilicon deposition are performed, and gate polysilicon 12 and gate oxide layer 11 are etched back. Using the gate polysilicon 12 and the gate oxide layer 11 as a mask, the...
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