Wet film-coating system

Abstract

The invention relates to a wet film-coating system which comprises a film-coating chamber, an annealing chamber and a cavity door arranged on the annealing chamber which are optionally and mutually communicated, wherein, the film-coating chamber comprises a wet film coating device and a clamping arm, the film coating is carried out on at least one substrate to be coated by the wet film coating device, the clamping arm clamps and drives the wet film coating device to move freely in the film-coating chamber and the annealing chamber, and loading and unloading of at least one substrate to be coated on the wet film coating device are carried out by the cavity door in the annealing chamber; and the annealing chamber comprises a heating device for heating the coated substrate generated by the wet film coating device, and the heated substrate is cooled in the annealing chamber. By film coating and heating in the film-coating chamber and the annealing chamber which are mutually communicated, the wet film-coating system avoids the oxidation problem caused by movement of the coated substrate in air and improves film-coating yield rate.

Description

technical field [0001] The invention relates to a coating technology, in particular to a wet coating system. Background technique [0002] At present, thin film preparation technologies are generally divided into two methods: dry coating and wet coating. Among them, the wet coating process has the advantages of simple process equipment, cheap, fast deposition rate, easy control of deposition thickness and characteristics, low process temperature, not limited to substrates with complex shapes, suitable for diverse materials, and can prepare thin films on flexible Substrate superiority. Therefore, in recent years, the wet coating process has been widely used to deposit coatings of materials such as ceramics, polymers, and metals. The coated substrate produced by wet coating generally needs to be annealed, that is, the coated substrate is heated to 400-500°C for a period of time, and then cooled slowly, so that the film on the substrate can reach a certain performance. [00...

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Problems solved by technology

[0003] However, during the transfer of the substrate from the coating process to the annealing process, since the coated substrate is exposed to the air, it is easy to cause the film layer just coated on the coated substrate to be oxidized

Therefore, after the coating of the coated substrate is completed, the quality of the film layer of the coated substrate will be poor, resulting in a decrease in the yield of the coated film.

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